Proceedings of the Symposia on Electronic and Optical Properties of Polycrystalline Or Impure Semiconductors and Novel Silicon Growth Methods
Author: K. V. Ravi
Publisher:
Published: 1980
Total Pages: 284
ISBN-13:
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Author: K. V. Ravi
Publisher:
Published: 1980
Total Pages: 284
ISBN-13:
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Publisher:
Published: 1986
Total Pages: 142
ISBN-13:
DOWNLOAD EBOOKAuthor: James A. Amick
Publisher:
Published: 1983
Total Pages: 504
ISBN-13:
DOWNLOAD EBOOKAuthor: J. Grabmaier
Publisher: Springer Science & Business Media
Published: 2013-06-29
Total Pages: 204
ISBN-13: 3642681751
DOWNLOAD EBOOK1.1 The Role of Silicon as a Semiconductor Silicon is unchallenged as a semiconductor base material in our present electronics indu stry. The reasons why it qualifies so strongly for this particular purpose are manyfold. The attractive combination of physical (electrical) properties of silicon and the unique properties of its native oxide layer have been the original factors for its breathtaking evolution in device technology. The majority of reasons, however, for its present status are correlated with industrial prosessing in terms of charge units ( economy), reliability (reproducibility), and flexibility, but also its availability. The latter point, in particular, plays an important role in the different long-term projects on the terrestrial application of solar cells. Practically inexhaustive resources of silicon dioxide form a sound basis even for the most pretentious programs on future alternatives to relieve the present situation in electrical power generation by photovol taics. Assuming a maximum percentage of 10% to be replaced by the year 2000 would roughly mean a cumulative annual production of 2 million metric tons of crude silicon (based on present solar cell standards)!). To illustrate the orders of magnitude that have to be discussed in pertinent programs: Today, the industrial silicon capacity of non-communistic countries (including ferrosili con and other alloys by their relative Si-content) amounts to some 2 million tons per year.
Author: Hans J. Scheel
Publisher: John Wiley & Sons
Published: 2009-07-31
Total Pages: 695
ISBN-13: 0470491108
DOWNLOAD EBOOKThis volume deals with the technologies of crystal fabrication, of crystal machining, and of epilayer production and is the first book on industrial and scientific aspects of crystal and layer production. The major industrial crystals are treated: Si, GaAs, GaP, InP, CdTe, sapphire, oxide and halide scintillator crystals, crystals for optical, piezoelectric and microwave applications and more. Contains 29 contributions from leading crystal technologists covering the following topics: * General aspects of crystal growth technology * Silicon * Compound semiconductors * Oxides and halides * Crystal machining * Epitaxy and layer deposition Scientific and technological problems of production and machining of industrial crystals are discussed by top experts, most of them from the major growth industries and crystal growth centers. In addition, it will be useful for the users of crystals, for teachers and graduate students in materials sciences, in electronic and other functional materials, chemical and metallurgical engineering, micro-and optoelectronics including nanotechnology, mechanical engineering and precision-machining, microtechnology, and in solid-state sciences.
Author: Vijay K. Kapur
Publisher:
Published: 1985
Total Pages: 436
ISBN-13:
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Publisher:
Published: 1982
Total Pages: 548
ISBN-13:
DOWNLOAD EBOOKAuthor: Hisham Z. Massoud
Publisher: The Electrochemical Society
Published: 1997
Total Pages: 686
ISBN-13: 9781566771306
DOWNLOAD EBOOKAuthor:
Publisher:
Published: 1985
Total Pages: 158
ISBN-13:
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