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Author: Ohmi
Publisher: Routledge
Published: 2017-11-01
Total Pages: 948
ISBN-13: 1351406426
DOWNLOAD EBOOKEvaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Tadahiro Ōmi
Publisher:
Published: 1993
Total Pages:
ISBN-13:
DOWNLOAD EBOOKAuthor: Ohmi
Publisher: CRC Press
Published: 2019-08-30
Total Pages: 944
ISBN-13: 9780367402341
DOWNLOAD EBOOKEvaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: S. Lerman
Publisher:
Published: 1994
Total Pages: 1
ISBN-13:
DOWNLOAD EBOOKThis work is the first in what appears to be a comprehensive treatise on ultraclean technology in the semiconductor industry and other industries that require ultraclean technology. As the title indicates, this is a handbook, or more accurately, an in-depth encyclopedic treatment of the subject. Its audience includes scientists, engineers, and others involved with virtually any aspect of ultrapure water, and, although the author's target is the semiconductor industry, this volume is valuable to anyone working with ultrapure water.
Author: Karen Reinhardt
Publisher: William Andrew
Published: 2018-03-16
Total Pages: 794
ISBN-13: 032351085X
DOWNLOAD EBOOKHandbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Author: Zeman
Publisher: Routledge
Published: 2017-11-22
Total Pages: 642
ISBN-13: 135143151X
DOWNLOAD EBOOKIntegrates knowledge on microfiltration and ultrification, membrane chemistry, and characterization methods with the engineering and economic aspects of device performance, device and module design, processes, and applications. The text provides a discussion of membrane fundamentals and an analytical framework for designing and developing new filtrations systems for a broad range of technologically important functions. It offers information on membrane liquid precursors, fractal and stochastic pore space analysis, novel and advanced module designs, and original process design calculations.
Author: Karen Reinhardt
Publisher: William Andrew
Published: 2008
Total Pages: 660
ISBN-13: 9781493303434
DOWNLOAD EBOOKThe second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries. Covers processes and equipment, as well as new materials and changes required for the surface conditioning process. Editors are two of the top names in the field and are both extensively published. Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol."
Author: David L. Elliott
Publisher: Academic Press
Published: 2014-06-28
Total Pages: 367
ISBN-13: 1483296512
DOWNLOAD EBOOKUltraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields. The text enables practicing engineers and researchers to utilize concepts and innovations to solve actual problems encountered in UV optical technology applications. It also offers a wealth of information for equipment designers and manufacturers. Those in laser fields (including medical, electronics, and semiconductors), students, engineers, technicians, as well as newcomers to the subject who require a basic introduction to the topic, will all find Ultraviolet Laser Technology and Applications to be an essential resource. Serves as a valuable, practical reference to UV laser technology Presents detailed technical data and techniques Offers highly illustrated optics designs and beam delivery systems Includes an extensive bibliography, references, and glossary Covers all major UV laser markets and technology systems
Author: Takeshi Hattori
Publisher: Springer Science & Business Media
Published: 2013-03-09
Total Pages: 634
ISBN-13: 3662035359
DOWNLOAD EBOOKA totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Norman N Li
Publisher: John Wiley & Sons
Published: 2011-09-20
Total Pages: 1105
ISBN-13: 1118211545
DOWNLOAD EBOOKAdvanced membranes-from fundamentals and membrane chemistry to manufacturing and applications A hands-on reference for practicing professionals, Advanced Membrane Technology and Applications covers the fundamental principles and theories of separation and purification by membranes, the important membrane processes and systems, and major industrial applications. It goes far beyond the basics to address the formulation and industrial manufacture of membranes and applications. This practical guide: Includes coverage of all the major types of membranes: ultrafiltration; microfiltration; nanofiltration; reverse osmosis (including the recent high-flux and low-pressure membranes and anti-fouling membranes); membranes for gas separations; and membranes for fuel cell uses Addresses six major topics: membranes and applications in water and wastewater; membranes for biotechnology and chemical/biomedical applications; gas separations; membrane contractors and reactors; environmental and energy applications; and membrane materials and characterization Includes discussions of important strategic issues and the future of membrane technology With chapters contributed by leading experts in their specific areas and a practical focus, this is the definitive reference for professionals in industrial manufacturing and separations and research and development; practitioners in the manufacture and applications of membranes; scientists in water treatment, pharmaceutical, food, and fuel cell processing industries; process engineers; and others. It is also an excellent resource for researchers in industry and academia and graduate students taking courses in separations and membranes and related fields.
