This book examines mechatronics and automatic control systems. The book covers important emerging topics in signal processing, control theory, sensors, mechanic manufacturing systems and automation. The book presents papers from the second International Conference on Mechatronics and Automatic Control Systems held in Beijing, China on September 20-21, 2014. Examines how to improve productivity through the latest advanced technologies Covering new systems and techniques in the broad field of mechatronics and automatic control systems
This book focuses exclusively on control of interfacial properties and structures for semiconductor device applications from the point of view of improving and developing novel electrical properties. The following topics are covered: metal-semiconductors, semiconductor hetero-interfaces, characterization, semiconducting new materials, insulator-semiconductor, interfaces in device, control of interface formation, control of interface properties, contact metallization. A variety of up-to-date research topics such as atomic layer epitaxy, atomic layer passivation, atomic scale characterization including STM and SR techniques, single ion implementation, self-organization crystal growth, in situ measurements for process control and extremely high-spatial resolution analysis techniques, are also included. Furthermore it bridges the macroscopic, mesoscopic, and atomic-scale regimes of semicondutor interfaces, describing the state of the art in forming, controlling and characterizating unique semiconductor interfaces, which will be of practical importance in advanced devices. Intended for both technologists who require an up-to-date assessment of methods for interface formation, processing and characterization, and solid state researchers who desire the latest developments in understanding the basic mechanisms of interface physics, chemistry and electronics, this book will be a welcome addition to the existing literature.
Semiconductor interfaces are of paramount importance in micro, nano- and optoelectronics. Basic as well as applied research on such systems is therefore of extremely high current interest. To meet the continuous need for a better understanding of semiconductor interfaces with respect to both their fundamental physical and chemical properties as well as their applications in modern opto- and microelectronics, the series of international conferences on the formation of semiconductor interfaces was begun. The fourth conference of the series held in Jülich addresses as main topics: clean semiconductor surfaces; adsorbates at semiconductor surfaces; metal-semiconductor, insulator-semiconductor and semiconductor-semiconductor interfaces; devices and wet chemical processes. The 12 invited lectures assess the present status of the research in important areas and about 180 contributed papers describe most recent achievements in the field.
July 13-14, 2017 Berlin, Germany Key Topics : Materials Science and Engineering, Materials Chemistry in Developing Areas, Formulating Materials Chemistry, Materials Synthesis and Characterization, Insilico Materials Chemistry, Regenerative Materials Chemistry, Polymer Materials and Technology, Applied Materials Chemistry, Current Innovations in Materials Chemistry, Research Aspects of Materials Chemistry, Role of Graphene in Advanced Materials, Materials Chemistry and Physics, Nanomaterials,
