Introduction to Plasma Dynamics

Introduction to Plasma Dynamics

Author: A. I. Morozov

Publisher: CRC Press

Published: 2012-12-06

Total Pages: 828

ISBN-13: 1439881332

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As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the


Principles of Plasma Discharges and Materials Processing

Principles of Plasma Discharges and Materials Processing

Author: Michael A. Lieberman

Publisher: John Wiley & Sons

Published: 2024-10-15

Total Pages: 837

ISBN-13: 1394245378

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A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.


Fundamentals of Electric Propulsion

Fundamentals of Electric Propulsion

Author: Dan M. Goebel

Publisher: John Wiley & Sons

Published: 2008-12-22

Total Pages: 528

ISBN-13: 0470436263

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Throughout most of the twentieth century, electric propulsion was considered the technology of the future. Now, the future has arrived. This important new book explains the fundamentals of electric propulsion for spacecraft and describes in detail the physics and characteristics of the two major electric thrusters in use today, ion and Hall thrusters. The authors provide an introduction to plasma physics in order to allow readers to understand the models and derivations used in determining electric thruster performance. They then go on to present detailed explanations of: Thruster principles Ion thruster plasma generators and accelerator grids Hollow cathodes Hall thrusters Ion and Hall thruster plumes Flight ion and Hall thrusters Based largely on research and development performed at the Jet Propulsion Laboratory (JPL) and complemented with scores of tables, figures, homework problems, and references, Fundamentals of Electric Propulsion: Ion and Hall Thrusters is an indispensable textbook for advanced undergraduate and graduate students who are preparing to enter the aerospace industry. It also serves as an equally valuable resource for professional engineers already at work in the field.


Introduction to Plasma Physics and Controlled Fusion

Introduction to Plasma Physics and Controlled Fusion

Author: Francis F. Chen

Publisher: Springer Science & Business Media

Published: 2013-03-09

Total Pages: 427

ISBN-13: 1475755953

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TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.


Plasma Engineering

Plasma Engineering

Author: Michael Keidar

Publisher: Academic Press

Published: 2018-08-06

Total Pages: 587

ISBN-13: 0128137037

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Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications


Introduction to Plasma Physics

Introduction to Plasma Physics

Author: R.J Goldston

Publisher: CRC Press

Published: 2020-07-14

Total Pages: 514

ISBN-13: 9781439822074

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Introduction to Plasma Physics is the standard text for an introductory lecture course on plasma physics. The text's six sections lead readers systematically and comprehensively through the fundamentals of modern plasma physics. Sections on single-particle motion, plasmas as fluids, and collisional processes in plasmas lay the groundwork for a thorough understanding of the subject. The authors take care to place the material in its historical context for a rich understanding of the ideas presented. They also emphasize the importance of medical imaging in radiotherapy, providing a logical link to more advanced works in the area. The text includes problems, tables, and illustrations as well as a thorough index and a complete list of references.


Fundamentals of Plasma Physics

Fundamentals of Plasma Physics

Author: J. A. Bittencourt

Publisher: Springer Science & Business Media

Published: 2013-06-29

Total Pages: 700

ISBN-13: 1475740301

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Fundamentals of Plasma Physics is a general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory, with applications to a variety of important plasma phenomena. Its clarity and completeness makes the text suitable for self-learning and for self-paced courses. Throughout the text the emphasis is on clarity, rather than formality, the various derivations are explained in detail and, wherever possible, the physical interpretations are emphasized. The mathematical treatment is set out in great detail, carrying out the steps which are usually left to the reader. The problems form an integral part of the text and most of them were designed in such a way as to provide a guideline, stating intermediate steps with answers.