Crystalline Silicon

Crystalline Silicon

Author: Sukumar Basu

Publisher: BoD – Books on Demand

Published: 2011-07-27

Total Pages: 360

ISBN-13: 9533075872

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The exciting world of crystalline silicon is the source of the spectacular advancement of discrete electronic devices and solar cells. The exploitation of ever changing properties of crystalline silicon with dimensional transformation may indicate more innovative silicon based technologies in near future. For example, the discovery of nanocrystalline silicon has largely overcome the obstacles of using silicon as optoelectronic material. The further research and development is necessary to find out the treasures hidden within this material. The book presents different forms of silicon material, their preparation and properties. The modern techniques to study the surface and interface defect states, dislocations, and so on, in different crystalline forms have been highlighted in this book. This book presents basic and applied aspects of different crystalline forms of silicon in wide range of information from materials to devices.


Porous Silicon: Material, Technology and Devices

Porous Silicon: Material, Technology and Devices

Author: H. Münder

Publisher: Newnes

Published: 1996-07-08

Total Pages: 344

ISBN-13: 0444596348

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These proceedings represent the most recent progress in the field of porous silicon. Several papers present results in which the influence of the formation parameters on the structural and optical properties has been investigated. Further topics dealt with include: the influence of light during the formation process on the photoluminescence behaviour; fundamental mechanism of the photoluminescence; the electroluminescence of porous silicon; applications based on porous silicon; charge carrier transport.


SiGe Based Technologies

SiGe Based Technologies

Author: Y. Shiraki

Publisher: Elsevier

Published: 1993-02-18

Total Pages: 289

ISBN-13: 0444596895

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The preparation of silicon germanium microstructures, their physical, chemical and electrical characterization, and their device processing and application are reviewed in this book. Special emphasis is given to ultrathin Si/Ge superlattices. Topics covered include: Wafer preparation and epitaxial growth; surface effects driven phenomena, such as clustering, segregation, 'surfactants'; Analysis, both in situ and ex situ; Strain adjustment methods; High quality buffers; Modification of material properties by quantum wells and superlattices; Devices: Novel concepts, processing, modelling, demonstrators. The questions highlighted, particularly those articles comparing related or competing activities, will provide a wealth of knowledge for all those interested in the future avenues of theory and applications in this field.


Ion Beam Processing of Materials and Deposition Processes of Protective Coatings

Ion Beam Processing of Materials and Deposition Processes of Protective Coatings

Author: P.L.F. Hemment

Publisher: Newnes

Published: 2012-12-02

Total Pages: 630

ISBN-13: 0444596313

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Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.


Semiconductor Materials Analysis and Fabrication Process Control

Semiconductor Materials Analysis and Fabrication Process Control

Author: G.M. Crean

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 352

ISBN-13: 0444596917

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There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.


Fourier Transform Infrared Characterization of Polymers

Fourier Transform Infrared Characterization of Polymers

Author: H. Ishida

Publisher: Springer Science & Business Media

Published: 2013-03-09

Total Pages: 447

ISBN-13: 1468477765

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This book contains the proceedings of the Symposium on FT-IR Characterization of Polymers, which was held under the auspices of the Division of Polymer Chemistry, American Chemical Society (ACS) during the annual ACS meeting in Philadelphia, August, 1984. The content of each paper has been substantially extended from the papers presented during the conference. Due to the accidental, irrecoverable loss of the entire contents of the book by the computer system used for editorial purposes, the publication of this book has been delayed more than one year over the initial scheduled date. It has been a continuous, frustrating experience for the editor as well as for the authors. An extended Murphy's law, -anything can go wrong goes multiply wrong- has been demonstrated in editor's office. It necessitated, otherwise unnecessary, repeated proof reading during which time the editor had valuable experience ~n familiarizing himself with each paper much more than usual. The papers in this book are state-of-the-art even after such a delay. It is the authors pride and integrity toward the quality of each paper that makes the value of this book long lasting, while responsibility of the loss of any timeliness rests at the editor's hand. For the purpose of official records, submission and acceptance dates must be stated. All papers had been submitted by September, 1984, and had been accepted for publication by November, 1984, after the critical review processes.


Photomodulated Optical Reflectance

Photomodulated Optical Reflectance

Author: Janusz Bogdanowicz

Publisher: Springer Science & Business Media

Published: 2012-06-26

Total Pages: 217

ISBN-13: 3642301088

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One of the critical issues in semiconductor technology is the precise electrical characterization of ultra-shallow junctions. Among the plethora of measurement techniques, the optical reflectance approach developed in this work is the sole concept that does not require physical contact, making it suitable for non-invasive in-line metrology. This work develops extensively all the fundamental physical models of the photomodulated optical reflectance technique and introduces novel approaches that extend its applicability from dose monitoring towards detailed carrier profile reconstruction. It represents a significant breakthrough in junction metrology with potential for industrial implementation.


High Energy and High Dose Ion Implantation

High Energy and High Dose Ion Implantation

Author: S.U. Campisano

Publisher: Elsevier

Published: 1992-06-16

Total Pages: 320

ISBN-13: 0444596798

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Ion beam processing is a means of producing both novel materials and structures. The contributions in this volume strongly focus on this aspect and include many papers reporting on the modification of the electrical and structural properties of the target materials, both metals and semiconductors, as well as the synthesis of buried and surface compound layers. Many examples on the applications of high energy and high dose ion implantation are also given. All of the papers from Symposia C and D are presented in this single volume because the interests of many of the participants span both topics. Additionally many of the materials science aspects, including experimental methods, equipment and processing problems, diagnostic and analytical techniques are common to both symposia.