High Temperature Shape Memory Alloys for Useful Devices
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Published: 2001
Total Pages: 27
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DOWNLOAD EBOOKThe goal of this project was to develop shape memory alloys with transition temperatures above 100 deg C. The main focus was on TiNiHf. Special vacuum sputtering setups were used to produce thin films having variations in composition, ranging from those rich in Ti+Hf to those rich in Ni. Three targets were used: TiNi, Hf, and Ni. Deposition rates were calibrated separately for each target. These calibrations were used to calculate composition of film deposited by simultaneous sputtering from all three targets. Although this procedure does not permit measurement of absolute composition, it makes possible a methodical search for alloys with increased transition temperature and improved ductility by systematic and controlled variation of composition. Depositions were done with predicted alloy compositions close to 50 at% Ni, the balance being Ti+Hf. The Hf concentration was varied within the range 10 - 15 at%. TiNiHf films were produced having transition temperatures above 100 deg C, with austenite finish temperatures as high as 170 deg C. Measurements of phase transformation temperature, ductility, and composition were made. High ductility and shape recovery up to 4 percent was achieved. Micromachined valve actuators were fabricated and tested. Actuators demonstrated thermomechanical performance similar to that of binary TiNi film.