Electron Beam Lithography Process Optimization
Electron Beam Lithography Process Optimization

Author: Rohan Handa

Publisher: GRIN Verlag

Published: 2011-12

Total Pages: 37

ISBN-13: 3656083169

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Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.

Electron Beam Lithography Process Optimization
Electron Beam Lithography Process Optimization

Author: Rohan Handa

Publisher: GRIN Verlag

Published: 2011-12-14

Total Pages: 17

ISBN-13: 3656083304

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Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.

Nanofabrication
Nanofabrication

Author: Maria Stepanova

Publisher: Springer Science & Business Media

Published: 2011-11-08

Total Pages: 344

ISBN-13: 3709104246

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Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Handbook of Microscopy for Nanotechnology
Handbook of Microscopy for Nanotechnology

Author: Nan Yao

Publisher: Springer Science & Business Media

Published: 2006-07-12

Total Pages: 745

ISBN-13: 1402080069

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Nanostructured materials take on an enormously rich variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure-composition-processing-property relationships for these sub 100 nm-sized materials can only be understood by employing an array of modern microscopy and microanalysis tools. Handbook of Microscopy for Nanotechnology aims to provide an overview of the basics and applications of various microscopy techniques for nanotechnology. This handbook highlights various key microcopic techniques and their applications in this fast-growing field. Topics to be covered include the following: scanning near field optical microscopy, confocal optical microscopy, atomic force microscopy, magnetic force microscopy, scanning turning microscopy, high-resolution scanning electron microscopy, orientational imaging microscopy, high-resolution transmission electron microscopy, scanning transmission electron microscopy, environmental transmission electron microscopy, quantitative electron diffraction, Lorentz microscopy, electron holography, 3-D transmission electron microscopy, high-spatial resolution quantitative microanalysis, electron-energy-loss spectroscopy and spectral imaging, focused ion beam, secondary ion microscopy, and field ion microscopy.

X-ray optics made by X-ray lithography: Process optimization and quality control
X-ray optics made by X-ray lithography: Process optimization and quality control

Author: Koch, Frieder Johannes

Publisher: KIT Scientific Publishing

Published: 2017-10-16

Total Pages: 168

ISBN-13: 3731506793

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Grating based X-ray phase contrast imaging sets out to overcome the limits of conventional X-ray imaging in the detection of subtle density differences and opens a way to characterize a sample's microstructure without the need for ultrahigh spatial resolution. The technique relies on grating structures with micrometric periods and extreme aspect ratio - their fabrication by X-ray lithography with optimal structure quality is the topic of this work.

Handbook of VLSI Microlithography, 2nd Edition
Handbook of VLSI Microlithography, 2nd Edition

Author: John N. Helbert

Publisher: William Andrew

Published: 2001-04-01

Total Pages: 1025

ISBN-13: 0815517807

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This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.