Current Trends in Optical and X-ray Metrology of Advanced Materials for Nanoscale Devices III
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Published: 2013
Total Pages: 141
ISBN-13:
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Author:
Publisher:
Published: 2013
Total Pages: 141
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DOWNLOAD EBOOKAuthor: Bernard Servet
Publisher:
Published: 2010
Total Pages: 408
ISBN-13:
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Published: 2006
Total Pages:
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Published: 1956
Total Pages: 71
ISBN-13:
DOWNLOAD EBOOKAuthor: Bernard Servet
Publisher:
Published: 2008
Total Pages: 6
ISBN-13:
DOWNLOAD EBOOKAuthor: D. Keith Bowen
Publisher: CRC Press
Published: 2018-10-03
Total Pages: 296
ISBN-13: 1420005650
DOWNLOAD EBOOKThe scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.
Author: D. Chateigner
Publisher:
Published: 2004
Total Pages:
ISBN-13:
DOWNLOAD EBOOKAuthor: Christopher Taudt
Publisher: Springer Nature
Published: 2021-11-16
Total Pages: 180
ISBN-13: 3658359269
DOWNLOAD EBOOKThis Open Access book discusses an extension to low-coherence interferometry by dispersion-encoding. The approach is theoretically designed and implemented for applications such as surface profilometry, polymeric cross-linking estimation and the determination of thin-film layer thicknesses. During a characterization, it was shown that an axial measurement range of 79.91 μm with an axial resolution of 0.1 nm is achievable. Simultaneously, profiles of up to 1.5 mm in length were obtained in a scan-free manner. This marked a significant improvement in relation to the state-of-the-art in terms of dynamic range. Also, the axial and lateral measurement range were decoupled partially while functional parameters such as surface roughness were estimated. The characterization of the degree of polymeric cross-linking was performed as a function of the refractive index. It was acquired in a spatially-resolved manner with a resolution of 3.36 x 10-5. This was achieved by the development of a novel mathematical analysis approach.
Author: Daniel Chateigner
Publisher:
Published: 2004
Total Pages: 231
ISBN-13:
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