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Author: Paul Mertens
Publisher:
Published: 2023-09-14
Total Pages: 0
ISBN-13: 9783036403120
DOWNLOAD EBOOKSelected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
Published: 2005-04-01
Total Pages: 383
ISBN-13: 3038130257
DOWNLOAD EBOOKUCPSS 2004 Proceddings of the 7th International Symposium on Ultra Cleyn Processing of Silicon Surfaces (UCPSS), Brussels, Belgium, Sept. 20-22, 2004
Author: Takeshi Hattori
Publisher: Springer Science & Business Media
Published: 2013-03-09
Total Pages: 634
ISBN-13: 3662035359
DOWNLOAD EBOOKA totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Michael Liehr
Publisher:
Published: 1995
Total Pages: 440
ISBN-13:
DOWNLOAD EBOOKWafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
Author: Robert P. Donovan
Publisher: CRC Press
Published: 2018-10-08
Total Pages: 460
ISBN-13: 1482289997
DOWNLOAD EBOOKRecognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.
Author:
Publisher:
Published: 2004
Total Pages: 426
ISBN-13:
DOWNLOAD EBOOKAuthor:
Publisher: The Electrochemical Society
Published: 2000
Total Pages: 636
ISBN-13: 9781566772594
DOWNLOAD EBOOKAuthor: Jerzy Rużyłło
Publisher: The Electrochemical Society
Published: 1998
Total Pages: 668
ISBN-13: 9781566771887
DOWNLOAD EBOOKAuthor: Ingegard Johansson
Publisher: Elsevier
Published: 2007-06-20
Total Pages: 994
ISBN-13: 0080555535
DOWNLOAD EBOOKThe focus of Handbook for Cleaning/Decontamination of Surfaces lies on cleaning and decontamination of surfaces and solid matter, hard as well as soft. Bringing together in a 2-volume reference source: - current knowledge of the physico-chemical fundamentals underlying the cleaning process; - the different needs for cleaning and how these needs are met by various types of cleaning processes and cleaning agents, including novel approaches; - how to test that cleaning has taken place and to what extent; - the effects of cleaning on the environment; - future trends in cleaning and decontamination, for example the idea of changing surfaces, to hinder the absorbance of dirt and thus make cleaning easier.A brief introduction is given to the legal demands concerning the environment and a historical background, in terms of development of detergents, from soaps to the modern sophisticated formulations. Bactericides, their use and the environmental demands on them are covered. Thorough discussions of mechanisms for cleaning are given in several chapters, both general basic concepts and special cases like particle cleaning and cleaning using microemulsion concepts.* General understanding of how cleaning works, function of ingredients and formulations * Overview of environmental issues and demands from the society in the area * Gives basic formulas for cleaning preparations in most areas
Author: Hari Singh Nalwa
Publisher: Academic Press
Published: 2001-06-13
Total Pages: 646
ISBN-13: 0080541232
DOWNLOAD EBOOKThis book covers a broad spectrum of the silicon-based materials and their device applications. This book provides a broad coverage of the silicon-based materials including different kinds of silicon-related materials, their processing, spectroscopic characterization, physical properties, and device applications. This two-volume set offers a selection of timely topics on silicon materials namely those that have been extensively used for applications in electronic and photonic technologies. The extensive reference provides broad coverage of silicon-based materials, including different types of silicon-related materials, their processing, spectroscopic characterization, physical properties, and device applications. Fourteen chapters review the state of the art research on silicon-based materials and their applications to devices. This reference contains a subset of articles published in AP's recently released Handbook of Advanced Electronic and Photonic Materials and Devices ( 2000, ISBN 012-5137451, ten volumes) by Dr. Hari Nalwa. This two-volume work strives to present a highly coherent coverage of silicon-based material uses in the vastly dynamic arena of silicon chip research and technology. Key Features * Covers silicon-based materials and devices * Include types of materials, their processing, fabrication, physical properties and device applications * Role of silicon-based materials in electronic and photonic technology * A very special topic presented in a timely manner and in a format
