Coupled Microwave ECR and Radio-frequency Plasma Source for Plasma Processing
Coupled Microwave ECR and Radio-frequency Plasma Source for Plasma Processing

Author:

Publisher:

Published: 1994

Total Pages:

ISBN-13:

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In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm.sup. 2 at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance.

High Density Plasma Sources
High Density Plasma Sources

Author: Oleg A. Popov

Publisher: Elsevier

Published: 1996-12-31

Total Pages: 467

ISBN-13: 0815517890

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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Time-Domain Computer Analysis of Nonlinear Hybrid Systems
Time-Domain Computer Analysis of Nonlinear Hybrid Systems

Author: Wenquan Sui

Publisher: CRC Press

Published: 2018-10-08

Total Pages: 416

ISBN-13: 1420040227

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The analysis of nonlinear hybrid electromagnetic systems poses significant challenges that essentially demand reliable numerical methods. In recent years, research has shown that finite-difference time-domain (FDTD) cosimulation techniques hold great potential for future designs and analyses of electrical systems. Time-Domain Computer Analysis of Nonlinear Hybrid Systems summarizes and reviews more than 10 years of research in FDTD cosimulation. It first provides a basic overview of the electromagnetic theory, the link between field theory and circuit theory, transmission line theory, finite-difference approximation, and analog circuit simulation. The author then extends the basic theory of FDTD cosimulation to focus on techniques for time-domain field solving, analog circuit analysis, and integration of other lumped systems, such as n-port nonlinear circuits, into the field-solving scheme. The numerical cosimulation methods described in this book and proven in various applications can effectively simulate hybrid circuits that other techniques cannot. By incorporating recent, new, and previously unpublished results, this book effectively represents the state of the art in FDTD techniques. More detailed studies are needed before the methods described are fully developed, but the discussions in this book build a good foundation for their future perfection.

Characteristics and Potential Applications of an ORNL Microwave ECR Multicusp Plasma Ion Source
Characteristics and Potential Applications of an ORNL Microwave ECR Multicusp Plasma Ion Source

Author:

Publisher:

Published: 1990

Total Pages: 22

ISBN-13:

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A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source that has two ECR plasma production regions and uses multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasma over large areas of 300 to 400 cm2 and could be scaled up to produce uniform plasma over 700 cm2 or larger. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The working gases used were argon, helium, hydrogen, and oxygen. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of the discharge parameters. The discharge characteristics and a hypothetical discharge mechanism for this plasma source are described and discussed. Potential applications, including plasma and ion-beam sources for manufacturing advanced microelectronics, for space electric propulsion, and for fusion research, are discussed. 10 refs., 10 figs.