Surfactant research explores the forces responsible for surfactant assembly and the critical industrial, medical, and personal applications, including viscosity control, microelectronics, drug stabilization, drug delivery, cosmetics, enhanced oil recovery, and foods. Surfactant Science and Technology: Retrospects and Prospects, "a Festschrift in ho
This and its companion volumes 7,8, and 10 document the proceedings of the 6th International Symposium on Surfactants in Solution (SIS) held in New Delhi, India, August 18-22, 1986 under the joint auspices of the Indian Society for Surface Science and Technology, and Indian Institute of Technology, Delhi. As this symposium was a landmark -- it represented the tenth anniversary of this series of symposia -- so it is very apropos to reflect on how these symposia have evolved to their present size and status. The pedigree of this series of symposia goes back to 1976 when the premier symposium in this series was held. Actually in 1976 it was a modest start and it was not possible at that time to gaze at the crystal ball and predict what would be the state of affairs in 1986. For historical purposes, it should be recorded here that the first symposium was held in Albany, NY, under the title "Micellization, Solubilization and Microemulsions"; the second symposium was christened "Solution Chemistry of Surfactants" and was held in Knoxville, TN, in 1978; the venue for the third symposium in 1980 was Potsdam, NY, and it was dubbed "International Symposium on Solution Behavior of Surfactants: Theoretical and Applied Aspects.
This and its companion Volume 2 comprise the proceedings of the International Symposium on "Solution Behavior of Surfactants - Theoretical and Applied Aspects" organized under the auspices of the 11th Northeast Regional Meeting of the American Chemical Soci ety held in Potsdam, N. Y. , June 30-July 3, 1980. This Symposium re presented the third event in the series of symposia dealing with the topic of surfactants in solution. The first Symposium was held in Albany, N. Y. , in 1976 under the title "Micellization, Solubili zation and Microemulsions", 1 the proceedings of which have been doc umented in a two-volume set • The second was held under the title "~olution Chemistry of Surfactants" in 1978 in Knoxville, TN, an~ the proceedings of this event have also been properly chronicled • Apropos, the fourth biennial Symposium in, this series is entitled "International Symposium on Surfactants in Solution" (K. L. Mittal and B. Lindman, Cochairmen) and is scheduled to be held from June 27 to July 2, 1982 in Lund, Sweden. Since these biennial events have been very successful and important in bringing researchers with varied interests together and in stimulating interdisciplinary communication, so the plans are to continue these on a regular basis with a change in venue for each meeting.
The surface of an object is the first thing we see or touch. Nearly every article or object we encounter at home, in industry, land transportation, aerospace, or the medical field in some way uses an adhesive, a sealant, or a decorative coating. Adhesion science provides the technology and the know-how behind these applications. Recent Advances in
This volume chronicles the proceedings of the Symposium on Particles on Surfaces: Detection, Adhesion and Removal held under the auspices of the Fine Particle Society in San Francisco, July 28-August 2, 1986. The study of particles on surfaces is extremely important in many areas of human endeavor (ranging from microelectronics to optics to biomedical). A complete catalog of modern precision and sophisticated technologies where particles on surfaces are of cardinal importance will be prohibitively long, but the following eclectic examples should underscore the concern about particles on a variety of surfaces. In the semiconductor world of shrinking dimensions, particles which, a few years ago, were cosmetically undesirable but functionally innocuous can potentially be killer defects now. As the device sizes get smaller, there will be more and more concern about smaller and smaller particles. In the information storage technology, the gap between the head and the disk is very narrow, and if a particle is trapped in the gap that can have very grave consequences. The implications of particulate contamination on sensitive optical surfaces is all too manifest. So the particulate contamination on surfaces is undesirable from functional, yield and reliability points of view. This symposium was organized with the following objectives in mind: to bring together active practitioners in this field; to provide a forum for discussion of the latest research and development activities in this area; to provide opportunity for cross-pollination of ideas; and to highlight topics which needed intensified effort.
This volume chronicles the proceedings of the Third Symposium on Particles on Surfaces : Detection, Adhesion and Removal held as a part of the 21st Annual Meeting of the Fine Particle Society in San Diego , California, August 21 - 25 , 1990 . The first two symposia i n t h i s series were held in 1986 and 1988 , respectively, and have been properly l documented ,2. Li ke its antecedent s the Third symposium was very well received, and the continuing success of these symposia reinforced our earlier belief that regular symposia on the topic of particles on surfaces were very much needed. Concomitantly, the fourth symposium in this series is planned in Las Vegas , July 13-17 , 199 2 . l As pointed out in the Preface to the earlier two volumes ,2, the topic of particles on surfaces is of tremendous interest and concern in a wide spectrum of technological areas . The objectives of the Third symposium were es s ent i a l ly the same as those of the earlier two and our intent her e was to provide an update on the research and development activities in the world of particles on surfaces . Apropos , there has been a deliberate attempt every time to s eek out new people to present their research results and we have been very succes s f ul in this mission.
This volume documents the proceedings of the Second Symposium on Metallized Plastics: Fundamental and Applied Aspects held under the aegis of the Dielectric Science and Technology Division of the Electrochemical Society in Montreal, Canada, May 7-10, 1990. The first symposium on this topic was held in Chicago, October 10-12, 1988 and the proceedings of l which have been chronicled in a hard-bound volume l As pointed out in the Preface to the proceedings of the first symposium the metallized plastics find scores of applications ranging from very mundane to very sophisticated. Even a cursory look at the literature will convince that this field has sprouted; and there is every reason to believe that with all the research and development activities taking place, new and exciting applications of metallized plastics will emerge. The program for the second symposium was very comprehensive as it included 46 papers covering many aspects of metallized plastics. This symposium was a testimonial to the brisk research activity and keen interest in the topic of metallized plastics. The success of this symposium reinforced our earlier belief that there was a definite need to hold symposia on this topic on a regular basis. Concomitantly, the third symposium in this vein was held in Phoenix, Arizona, October 13-18, 1991 and the fourth is planned for May 16-21, 1993 in Honolulu, Hawaii. As regards the present volume, it contains a total of 35 papers covering a variety of topics ranging from very fundamental to very applied.
This book chronicles the proceedings of the Second Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 20th Annual Fine Particle Society meeting in Boston, August 21-25, 1989. As this second symposium was as successful as the prior one, so we have decided to hold symposia on this topic on a regular (biennial) basis and the third symposium in this series is scheduled to be held at the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. l As pointed out in the Preface to the prior volume in this series that recently there has been tremendous concern about yield losses due to unwanted particles, and these unwelcome particles can originate from a legion of sources, including process gases and liquids. Also all signals indicate that in the future manufacture of sophisticated and sensitive microelectronic components (with shrinking dimensions) and other precision parts, the need for detection, characterization, analysis and control of smaller and smaller particles will be more intensified.
This book documents the proceedings of the Symposium on Particles in Fluids: Detection, Characterization and Control held as a part of the 18th Fine Particle Society meeting in Boston, August 3-7, 1987. This was the Premier symposium on this topic and the response was so good that we have decided to organize it on a biennial basis and the second symposium will be held under the rubric Particles in Gases and Liquids: Detection, Characterization and Control at the 20th Fine Particle Society meeting in Boston, August 22-26, 1989. In the modern manufacture of sophisticated and sensitive microelectronic components and other precision parts, there has been a great deal of concern about yield losses due to micrometer- and submicrometer-sized particles. These particles can originate from a number of sources including fluids, i. e. , gases and liquids used in the manufacturing process. So the detection, characterization and control or removal of these undesirable particles is of cardinal importance and this symposium was conceived and o~ganized with this in mind. The purposes of this symposium were to bring together those actively involved in all aspects of particles in fluids, to provide a forum for discussion of the latest techniques for the detection, characterization and control of particles, and to highlight areas which needed intensified R&D efforts. The printed program contained a total of 46 papers and a variety of topics dealing with various ramifications of particles in fluids were presented.
This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.
