Discusses the range of methods used to describe the structure, composition, and chemical nature of material surfaces, comparing the merits of each. The techniques standardly used in analytical laboratories auger electron and x-ray photoelectron spectroscopy, and secondary mass ion spectrometry are d
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.
This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.
The idea for this book stemmed from a remark by Philip Jennings of Murdoch University in a discussion session following a regular meeting of the Australian Surface Science group. He observed that a text on surface analysis and applica tions to materials suitable for final year undergraduate and postgraduate science students was not currently available. Furthermore, the members of the Australian Surface Science group had the research experience and range of coverage of sur face analytical techniques and applications to provide a text for this purpose. A of techniques and applications to be included was agreed at that meeting. The list intended readership of the book has been broadened since the early discussions, particularly to encompass industrial users, but there has been no significant alter ation in content. The editors, in consultation with the contributors, have agreed that the book should be prepared for four major groups of readers: - senior undergraduate students in chemistry, physics, metallurgy, materials science and materials engineering; - postgraduate students undertaking research that involves the use of analytical techniques; - groups of scientists and engineers attending training courses and workshops on the application of surface analytical techniques in materials science; - industrial scientists and engineers in research and development seeking a description of available surface analytical techniques and guidance on the most appropriate techniques for particular applications. The contributors mostly come from Australia, with the notable exception of Ray Browning from Stanford University.
Determining the elemental composition of surfaces is an essential measurement in characterizing solid surfaces. At present, many ap proaches may be applied for measuring the elemental and molecular composition of a surface. Each method has particular strengths and limitations that often are directly connected to the physical processes involved. Typically, atoms and molecules on the surface and in the near surface region may be excited by photons, electrons, ions, or neutrals, and the detected particles are emitted, ejected, or scattered ions or electrons. The purpose of this book is to bring together a discussion of the surface compositional analysis that depends on detecting scattered or sputtered ions, and the methods emphasized are those where instruments are commercially available for carrying out the analysis. For each topic treated, the physical principles, instrumentation, qualitative analysis, artifacts, quantitative analysis, applications, opportunities, and limita tions are discussed. The first chapter provides an overview of the role of elemental composition in surface science; compositional depth profiling; stimulation by an electric field, electrons, neutrals, or photons and detection of ions; and then stimulation by ions, and detection of ions, electrons, photons, or neutrals.
This book covers state-of-the-art techniques commonly used in modern materials characterization. Two important aspects of characterization, materials structures and chemical analysis, are included. Widely used techniques, such as metallography (light microscopy), X-ray diffraction, transmission and scanning electron microscopy, are described. In addition, the book introduces advanced techniques, including scanning probe microscopy. The second half of the book accordingly presents techniques such as X-ray energy dispersive spectroscopy (commonly equipped in the scanning electron microscope), fluorescence X-ray spectroscopy, and popular surface analysis techniques (XPS and SIMS). Finally, vibrational spectroscopy (FTIR and Raman) and thermal analysis are also covered.
* Expert, up-to-date guidance on the appropriate techniques of local chemical analysis * Comprehensive. This volume is an ideal starting point for material research and development, bringing together a number of techniques usually only found in isolation * Recent examples of the applications of techniques are provided in all cases Helping to solve the problems of materials scientists in academia and industry, this book offers guidance on appropriate techniques of chemical analysis of materials at the local level, down to the atomic scale. Comparisons are made between various techniques in terms of the nature of the probe employed. The detection limit and the optimum spatial resolution is also considered, as well as the range of atomic number that may be identified and the precision and methods of calibration, where appropriate. The Local Chemical Analysis of Materials is amply illustrated allowing the reader to easily see typical results. It includes a comparative table of techniques to aid selection for analysis and a table of acronyms, particularly valuable in this jargon-riddled area.