Science and Technology of Defects in Silicon
Science and Technology of Defects in Silicon

Author: C.A.J. Ammerlaan

Publisher: Elsevier

Published: 2014-01-01

Total Pages: 518

ISBN-13: 0080983642

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This volume reviews recent developments in the materials science of silicon. The topics discussed range from the fundamental characterization of the physical properties to the assessment of materials for device applications, and include: crystal growth; process-induced defects; topography; hydrogenation of silicon; impurities; and complexes and interactions between impurities.In view of its key position within the conference scope, several papers examine process induced defects: defects due to ion implantation, silicidation and dry etching, with emphasis being placed on the device aspects. Special attention is also paid to recent developments in characterization techniques on epitaxially grown silicon, and silicon-on-insulators.

Plasma Deposited Thin Films
Plasma Deposited Thin Films

Author: Mort

Publisher: CRC Press

Published: 2018-05-04

Total Pages: 253

ISBN-13: 1351084267

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In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.

Reference Data for Engineers
Reference Data for Engineers

Author: Mac E. Van Valkenburg

Publisher: Elsevier

Published: 2001-10-19

Total Pages: 1689

ISBN-13: 0080515967

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Reference Data for Engineers is the most respected, reliable, and indispensable reference tool for technical professionals around the globe. Written by professionals for professionals, this book is a complete reference for engineers, covering a broad range of topics. It is the combined effort of 96 engineers, scientists, educators, and other recognized specialists in the fields of electronics, radio, computer, and communications technology. By providing an abundance of information on essential, need-to-know topics without heavy emphasis on complicated mathematics, Reference Data for Engineers is an absolute "must-have" for every engineer who requires comprehensive electrical, electronics, and communications data at his or her fingertips. Featured in the Ninth Edition is updated coverage on intellectual property and patents, probability and design, antennas, power electronics, rectifiers, power supplies, and properties of materials. Useful information on units, constants and conversion factors, active filter design, antennas, integrated circuits, surface acoustic wave design, and digital signal processing is also included. The Ninth Edition also offers new knowledge in the fields of satellite technology, space communication, microwave science, telecommunication, global positioning systems, frequency data, and radar.* Widely acclaimed as the most practical reference ever published for a wide range of electronics and computer professionals, from technicians through post-graduate engineers.* Provides a great way to learn or review the basics of various technologies, with a minimum of tables, equations, and other heavy math.

MEMS Materials and Processes Handbook
MEMS Materials and Processes Handbook

Author: Reza Ghodssi

Publisher: Springer Science & Business Media

Published: 2011-03-18

Total Pages: 1211

ISBN-13: 0387473181

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MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.

Principles of VLSI and CMOS Integrated Circuits
Principles of VLSI and CMOS Integrated Circuits

Author: Jain Richa & Rai Amrita

Publisher: S. Chand Publishing

Published:

Total Pages:

ISBN-13: 8121940001

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For B.E./B.Tech students of all Technical Universities. Microelectronics/VLSI Design is an emerging subject in the field of electronics in recent years. It is an introductory source to internal parts of electronics at minute level. This book is covering CMOS Design from a digital system level to circuit level and providing a background in CMOS Processing Technology. The book includes basic theortical knowledge as well as good engineering practice. This book is recommended for B.Tech., M.Tech. and diploma students of all Indian Universities and also useful for competitive examinations.

Fundamentals of Semiconductor Processing Technology
Fundamentals of Semiconductor Processing Technology

Author: Badih El-Kareh

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 605

ISBN-13: 1461522099

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The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

Plasma Processing for VLSI
Plasma Processing for VLSI

Author: Norman G. Einspruch

Publisher: Academic Press

Published: 2014-12-01

Total Pages: 544

ISBN-13: 1483217752

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VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.