Physics and Technology of High-k Gate Dielectrics 7
Author: Samares Kar
Publisher:
Published: 2009
Total Pages: 493
ISBN-13: 9781607680932
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Physics and Technology of High-k Gate Dielectrics 7
Author: Samares Kar
Publisher: The Electrochemical Society
Published: 2009-09
Total Pages: 0
ISBN-13: 9781566777438
DOWNLOAD EBOOKThis issue of ECS Transactions covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility channels, work function and flat-band voltage control, novel and higher permittivity dielectric materials, interface issues, gate stack reliability, DRAM, non-volatile memories, and exploratory applications.
Physics and Technology of High-k Gate Dielectrics 6
Author: S. Kar
Publisher: The Electrochemical Society
Published: 2008-10
Total Pages: 550
ISBN-13: 1566776511
DOWNLOAD EBOOKThe issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Physics and Technology of High-k Gate Dielectrics 5
Author: Samares Kar
Publisher: The Electrochemical Society
Published: 2007
Total Pages: 676
ISBN-13: 1566775701
DOWNLOAD EBOOKThis issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Physics and Technology of High-k Gate Dielectrics I
Author: Samares Kar
Publisher:
Published: 2003
Total Pages: 330
ISBN-13:
DOWNLOAD EBOOKPhysics and Technology of High-k Gate Dielectrics 4
Author: Samares Kar
Publisher: The Electrochemical Society
Published: 2006
Total Pages: 565
ISBN-13: 1566775035
DOWNLOAD EBOOKThis issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Physics and Technology of High-k Gate Dielectrics II
Author: Samares Kar
Publisher: The Electrochemical Society
Published: 2004
Total Pages: 512
ISBN-13: 9781566774055
DOWNLOAD EBOOK"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.
Physics and Technology of High-k Gate Dielectrics 4
Author:
Publisher:
Published: 2006
Total Pages: 547
ISBN-13:
DOWNLOAD EBOOKHigh Permittivity Gate Dielectric Materials
Author: Samares Kar
Publisher: Springer Science & Business Media
Published: 2013-06-25
Total Pages: 515
ISBN-13: 3642365353
DOWNLOAD EBOOK"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
High-k Gate Dielectrics for CMOS Technology
Author: Gang He
Publisher: John Wiley & Sons
Published: 2012-08-10
Total Pages: 560
ISBN-13: 3527646361
DOWNLOAD EBOOKA state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
