Plasma Processing of Materials

Plasma Processing of Materials

Author: National Research Council

Publisher: National Academies Press

Published: 1991-02-01

Total Pages: 88

ISBN-13: 0309045975

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Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.


Plasma Sources for Thin Film Deposition and Etching

Plasma Sources for Thin Film Deposition and Etching

Author: Maurice H. Francombe

Publisher: Academic Press

Published: 2013-10-22

Total Pages: 343

ISBN-13: 0080925138

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This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. - Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed - Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils - Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology - Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination


Contamination Control and Cleanrooms

Contamination Control and Cleanrooms

Author: Alvin Lieberman

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 419

ISBN-13: 1468465120

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Contamination control standards and techniques for all phases of the production of high-technology products are spelled out in this applications-orientated guide. Practical cleaning methods for products and process fluids are accompanied by tips on selecting operations based on economy and efficiency. Explanations of contaminant measurement devices cover operation, error sources and remedial methods. Engineers will find vital data on contaminant sources, as well as coverage of operations and procedures that aggravate contaminant effects.


Scientific and Technical Aerospace Reports

Scientific and Technical Aerospace Reports

Author:

Publisher:

Published: 1995

Total Pages: 538

ISBN-13:

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Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.


Particles in Gases and Liquids 3

Particles in Gases and Liquids 3

Author: K.L. Mittal

Publisher: Springer Science & Business Media

Published: 2013-11-11

Total Pages: 289

ISBN-13: 1489911871

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This book documents the proceedings of the Third Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. This series of symposia was initiated in 1987 in light of the growing importance to eliminate particles from process gases and liquids. As pointed out in the Preface to antecedent volumes in this series that particles in process gases and liquids could cause significant yield losses in precision manufacturing and concomitantly there has been heightened interest in understanding the behavior of particles in gases and liquids and devising ways to eliminate, or at least reduce substantially, these particles. The concern about particles in gases and liquids has been there for qui.te some time in the microelectronics arena, but there are other areas also where particles are of significant concern, e.g. in operation theatres in hospitals, food and beverage industry, and pharmaceutical manufacturing. This symposium basically had the same objectives as its predecessors, but to provide an update on the R&D activity taking place in the arena of particle detection, characterization and control. The printed program comprised a total of 28 papers dealing with variegated aspects of particles in gases and liquids. There were brisk and lively discussions and the attendees offered many positive comments, which goes to show that it was a well-received and needed symposium.


Handbook of Semiconductor Interconnection Technology

Handbook of Semiconductor Interconnection Technology

Author: Geraldine Cogin Shwartz

Publisher: CRC Press

Published: 1997-11-24

Total Pages: 598

ISBN-13: 9780849384660

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Covering materials, processes, equipment, methodologies, characterization techniques, clean room practices, and ways to control contamination-related defects, this work offers up-to-date information on the application of interconnection technology to semiconductors. It offers an integration of technical, patent and industry literature.


Introduction to Complex Plasmas

Introduction to Complex Plasmas

Author: Michael Bonitz

Publisher: Springer Science & Business Media

Published: 2010-07-29

Total Pages: 451

ISBN-13: 3642105920

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Complex plasmas differ from traditional plasmas in many ways: these are low-temperature high pressure systems containing nanometer to micrometer size particles which may be highly charged and strongly interacting. The particles may be chemically reacting or be in contact with solid surfaces, and the electrons may show quantum behaviour. These interesting properties have led to many applications of complex plasmas in technology, medicine and science. Yet complex plasmas are extremely complicated, both experimentally and theoretically, and require a variety of new approaches which go beyond standard plasma physics courses. This book fills this gap presenting an introduction to theory, experiment and computer simulation in this field. Based on tutorial lectures at a very successful recent Summer Institute, the presentation is ideally suited for graduate students, plasma physicists and experienced undergraduates.