This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Emphasis is placed on practicability of the various approaches. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics. The book is written by international top experts, all of whom are involved in industrial research and development projects.
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
This new volume of the highly respected Physics of Thin Films Serial discusses inhomogeneity in real films and surfaces. The volume, guest-edited by K. Vedam, follows the growth of thin films both from the surface of the substrate, and from the atomic level, layer by layer. The text features coverage of Real-Time Spectroscopic Ellipsometry (RTSE) and Reflectance Anisotropy (RA), two major breakthrough optical techniques used to characterize real time and insitu films and surfaces. In six insightful chapters, the contributors assess the impact of these techniques, their strengths and limitations, and their potential for further development.
Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.
The book is devoted to the design, application and characterization of thin films and structures, with special emphasis on optical applications. It comprises ten papers—five featured and five regular—authored by scientists all over the world. Diverse materials are studied and their possible applications are demonstrated and discussed—transparent conductive coatings and structures from ZnO doped with Al and Ga and Ti-doped SnO2, polymers and nanosized zeolite thin films for optical sensing, TiO2 with linear and nonlinear optical properties, organic diamagnetic materials, broadband optical coatings, CrWN glass molding coatings, and silicon on insulator waveguides.
Thin films can be used to fabricate optoelectronic devices. Technology is currently focusing on ternary thin film composition because of their structure, inter-band transitions and other optical properties that can be maximized. This book discusses in detail the optical characteristics of ternary thin films and further investigates the behavior of Iron Zinc Sulphide, Lead Silver Sulphide, Copper Silver Sulphide, Copper Zinc Sulphide and Cadmium Zinc Sulphide. Thin films are of fundamental importance in modern technology.
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Thin films can be used to fabricate optoelectronic devices. Technology is currently focusing on ternary thin film composition because of their structure, inter-band transitions and other optical properties that can be maximized. This book discusses in detail the optical characteristics of ternary thin films and further investigates the behavior of Iron Zinc Sulphide, Lead Silver Sulphide, Copper Silver Sulphide, Copper Zinc Sulphide and Cadmium Zinc Sulphide. Thin films are of fundamental importance in modern technology.
