Microscopy of Semiconducting Materials 1989, Proceedings of the Royal Microscopical Society Conference Held at Oxford University, 10-13 April 1989

Microscopy of Semiconducting Materials 1989, Proceedings of the Royal Microscopical Society Conference Held at Oxford University, 10-13 April 1989

Author: A. G. Cullis

Publisher: CRC Press

Published: 1989

Total Pages: 856

ISBN-13:

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Microscopy of Semiconducting Materials 1989 brings together both the invited and contributed papers from this conference. The main subject areas covered include: high resolution microscopy, microanalysis, epitaxial layers, quantum wells and superlattices, bulk GaAs, X-ray studies, dielectric structures, silicides and metal-semiconductor contacts, device studies and advanced scanning microscopy techniques. This volume provides an indispensable guide for researchers in physics, materials science, electronics and electrical engineering.


Microscopy of Semiconducting Materials

Microscopy of Semiconducting Materials

Author: A.G Cullis

Publisher: CRC Press

Published: 2000-01-01

Total Pages: 782

ISBN-13: 9780750306508

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With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigate semiconducting structures. It also covers specimen preparation using focused ion beam milling and advances in microscopy techniques using different types of scanning probes, such as AFM, STM, and SCM. In addition, the book discusses a range of materials, from finished devices to partly processed materials and structures, including nanoscale wires and dots. This volume provides an authoritative reference for all academics and researchers in materials science, electrical and electronic engineering and instrumentation, and condensed matter physics.


Microscopy of Semiconducting Materials 2001

Microscopy of Semiconducting Materials 2001

Author: A.G. Cullis

Publisher: CRC Press

Published: 2018-01-18

Total Pages: 626

ISBN-13: 1351083074

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The Institute of Physics Conference Series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists.


Microscopy of Semiconducting Materials 1995, Proceedings of the Institute of Physics Conference Held at Oxford University, 20-23 March 1995

Microscopy of Semiconducting Materials 1995, Proceedings of the Institute of Physics Conference Held at Oxford University, 20-23 March 1995

Author: A. G. Cullis

Publisher: CRC Press

Published: 1995

Total Pages: 824

ISBN-13:

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This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.