Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films

Author: Douglas B. Chrisey

Publisher: Wiley-Interscience

Published: 1994-06-21

Total Pages: 0

ISBN-13: 9780471592181

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A comprehensive overview of what is required to set up and begin research in this newly developing technology and understand the basics of the process. Internationally recognized experts in their fields cover such fundamentals as history, theory, film characteristics, surface modification, laser technology, materials and applications including excellent reviews regarding the entire areas of semiconductor buffer layers, thin-film ferroelectrics and ferrites along with the work involving films deposited by PLD.


Advanced Nano Deposition Methods

Advanced Nano Deposition Methods

Author: Yuan Lin

Publisher: John Wiley & Sons

Published: 2016-08-29

Total Pages: 328

ISBN-13: 3527696458

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This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.


Handbook of Laser Micro- and Nano-Engineering

Handbook of Laser Micro- and Nano-Engineering

Author: KOJI SUGIOKA.

Publisher:

Published: 2019

Total Pages:

ISBN-13: 9783319695372

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This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.


Fundamentals of Semiconductors

Fundamentals of Semiconductors

Author: Peter YU

Publisher: Springer Science & Business Media

Published: 2010-04-07

Total Pages: 778

ISBN-13: 3642007104

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Excellent bridge between general solid-state physics textbook and research articles packed with providing detailed explanations of the electronic, vibrational, transport, and optical properties of semiconductors "The most striking feature of the book is its modern outlook ... provides a wonderful foundation. The most wonderful feature is its efficient style of exposition ... an excellent book." Physics Today "Presents the theoretical derivations carefully and in detail and gives thorough discussions of the experimental results it presents. This makes it an excellent textbook both for learners and for more experienced researchers wishing to check facts. I have enjoyed reading it and strongly recommend it as a text for anyone working with semiconductors ... I know of no better text ... I am sure most semiconductor physicists will find this book useful and I recommend it to them." Contemporary Physics Offers much new material: an extensive appendix about the important and by now well-established, deep center known as the DX center, additional problems and the solutions to over fifty of the problems at the end of the various chapters.


Applications of Laser Ablation

Applications of Laser Ablation

Author: Dongfang Yang

Publisher: BoD – Books on Demand

Published: 2016-12-21

Total Pages: 430

ISBN-13: 9535128116

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Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.


Cold Gas Dynamic Spray

Cold Gas Dynamic Spray

Author: Roman Gr. Maev

Publisher: CRC Press

Published: 2016-04-27

Total Pages: 342

ISBN-13: 1466584432

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Your Guide to Advanced Cold Spray TechnologyCold Gas Dynamic Spray centers on cold gas dynamic spray (or cold spray-CS) technology, one of the most versatile thermal spray coating methods in materials engineering, and effectively describes and analyzes the main trends and developments behind the spray (coating) techniques. The book combines theory


Laser Ablation and Desorption

Laser Ablation and Desorption

Author:

Publisher: Academic Press

Published: 1997-12-10

Total Pages: 671

ISBN-13: 0080860206

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This volume introduces the subject of laser ablation and desorption to scientists and engineers. It covers fundamental experimental and theoretical tools, models, and techniques, and introduces the most important applications. Clearly written and organized in a straightforward manner, Laser Ablation and Desorption lead the reader straight through the fundamentals of laser-surface interactions. Each chapter is self-contained and includes references to other chapters as necessary, so that readers may begin with the topic of greatest interest and follow the references to other aspects of the subject contained within the book.Key Features* Provides up-to-date information about one of the most active fields in physics today* Written and edited by major figures in the field of laser ablation and desorption* Represents the most comprehensive treatment of the state-of-the-art available


Leading-edge Semiconductor Research

Leading-edge Semiconductor Research

Author: Thomas B. Elliot

Publisher: Nova Publishers

Published: 2005

Total Pages: 270

ISBN-13: 9781594545740

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This book includes within its scope studies of the structural, electrical, optical and acoustical properties of bulk, low-dimensional and amorphous semiconductors; computational semiconductor physics; interface properties, including the physics and chemistry of heterojunctions, metal-semiconductor and insulator-semiconductor junctions; all multi-layered structures involving semiconductor components. Dopant incorporation. Growth and preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring of epitaxial growth processes, also included are appropriate aspects of surface science such as the influence of growth kinetics and chemical processing on layer and device properties. The physics of semiconductor electronic and optoelectronic devices are examined , including theoretical modelling and experimental demonstration; all aspects of the technology of semiconductor device and circuit fabrication. Relevant areas of 'molecular electronics' and semiconductor structures incorporating Langmuir-Blodgett films; resists, lithography and metallisation where they are concerned with the definition of small geometry structure. The structural, electrical and optical characterisation of materials and device structures are also included. The scope encompasses materials and device reliability: reliability evaluation of technologies; failure analysis and advanced analysis techniques such as SEM, E-beam, optical emission microscopy, acoustic microscopy techniques; liquid crystal techniques; noise measurement, reliability prediction and simulation; reliability indicators; failure mechanisms, including charge migration, trapping, oxide breakdown, hot carrier effects, electro-migration, stress migration; package- related failure mechanisms; effects of operational and environmental stresses on reliability.


Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films

Author: Robert Eason

Publisher: Wiley-Interscience

Published: 2007

Total Pages: 720

ISBN-13:

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Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.


Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors

Author: Cheol Seong Hwang

Publisher: Springer Science & Business Media

Published: 2013-10-18

Total Pages: 266

ISBN-13: 146148054X

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.