Focusing of Charged Particles V2
Focusing of Charged Particles V2

Author: Albert Septier

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 487

ISBN-13: 0323148468

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Focusing of Charged Particles, Volume II presents the aspects of particle optics, including the electron, the ion optical domains, and the accelerator field. This book provides a detailed analysis of the principles of the laws of propagation of beams. Comprised of three parts encompassing three chapters, this volume starts with an overview of how a beam of charged particles traverses a region that is at a uniform, constant, electrostatic potential. This book then discusses the principle of charge repulsion effect by which the space charge of the beam modifies the potential in the region that it traverses. Other chapters examine the general design techniques and performances obtainable for electron guns applicable for use in initiating a beam for linear beam tubes that is given in a condensed form. The last chapter deals with the two stable charged particles that can be accelerated, namely, protons and electrons. This book is a valuable resource to physicists, accelerator experts, and experimenters in search of interactions in the detector target.

Charged Particle Beams
Charged Particle Beams

Author: Stanley Humphries, JR.

Publisher: Courier Corporation

Published: 2013-04-04

Total Pages: 866

ISBN-13: 0486498689

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Detailed enough to serve as both text and reference, this volume addresses topics vital to understanding high-power accelerators and high-brightness-charged particle beams, including stochastic cooling, high-brightness injectors, and the free electron laser. 1990 edition.

Electron Microscopy In Material Science
Electron Microscopy In Material Science

Author: U Valdre

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 785

ISBN-13: 0323142567

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Electron Microscopy in Material Science covers the proceedings of the International School of Electron Microscopy held in Erice, Itsaly, in 1970. The said conference is intended to the developments of electron optics and electron microscopy and its applications in material science. The book is divided into four parts. Part I discusses the impact of electron microscopy in the science of materials. Part II covers topics such as electron optics and instrumentation; geometric electron optics and its problems; and special electron microscope specimen stages. Part III explains the theory of electron diffraction image contrast and then elaborates on related areas such as the application of electron diffraction and of electron microscopy to radiation; computing methods; and problems in electron microscopy. Part IV includes topics such as the transfer of image information in the electron microscope; phase contrast microscopy; and the magnetic phase contrast. The text is recommended for electron microscopists who are interested in the application of their field in material science, as well as for experts in the field of material science and would like to know about the importance of electron microscopy.

Principles of Charged Particle Acceleration
Principles of Charged Particle Acceleration

Author: Stanley Humphries

Publisher: Courier Corporation

Published: 2013-09-11

Total Pages: 588

ISBN-13: 0486320634

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This authoritative text offers a unified, programmed summary of the principles underlying all charged particle accelerators — it also doubles as a reference collection of equations and material essential to accelerator development and beam applications. The only text that covers linear induction accelerators, the work contains straightforward expositions of basic principles rather than detailed theories of specialized areas. 1986 edition.

Atomic, Molecular, and Optical Physics: Charged Particles
Atomic, Molecular, and Optical Physics: Charged Particles

Author:

Publisher: Academic Press

Published: 1995-11-29

Total Pages: 485

ISBN-13: 0080860176

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With this volume, Methods of Experimental Physics becomes Experimental Methods in the Physical Sciences, a name change which reflects the evolution of todays science. This volume is the first of three which will provide a comprehensive treatment of the key experimental methods of atomic, molecular, and optical physics; the three volumes as a set will form an excellent experimental handbook for the field. The wide availability of tunable lasers in the pastseveral years has revolutionized the field and lead to the introduction of many new experimental methods that are covered in these volumes. Traditional methods are also included to ensure that the volumes will be a complete reference source for the field.

Physics Of Intense Charged Particle Beams In High Energy Accelerators
Physics Of Intense Charged Particle Beams In High Energy Accelerators

Author: Ronald C Davidson

Publisher: World Scientific

Published: 2001-10-22

Total Pages: 603

ISBN-13: 1911298186

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Physics of Intense Charged Particle Beams in High Energy Accelerators is a graduate-level text — complete with 75 assigned problems — which covers a broad range of topics related to the fundamental properties of collective processes and nonlinear dynamics of intense charged particle beams in periodic focusing accelerators and transport systems. The subject matter is treated systematically from first principles, using a unified theoretical approach, and the emphasis is on the development of basic concepts that illustrate the underlying physical processes in circumstances where intense self fields play a major role in determining the evolution of the system. The theoretical analysis includes the full influence of dc space charge and intense self-field effects on detailed equilibrium, stability and transport properties, and is valid over a wide range of system parameters ranging from moderate-intensity, moderate-emittance beams to very-high-intensity, low-emittance beams. This is particularly important at the high beam intensities envisioned for present and next generation accelerators, colliders and transport systems for high energy and nuclear physics applications and for heavy ion fusion. The statistical models used to describe the properties of intense charged particle beams are based on the Vlasov-Maxwell equations, the macroscopic fluid-Maxwell equations, or the Klimontovich-Maxwell equations, as appropriate, and extensive use is made of theoretical techniques developed in the description of one-component nonneutral plasmas, and multispecies electrically-neutral plasmas, as well as established techniques in accelerator physics, classical mechanics, electrodynamics and statistical physics.Physics of Intense Charged Particle Beams in High Energy Accelerators emphasizes basic physics principles, and the thorough presentation style is intended to have a lasting appeal to graduate students and researchers alike. Because of the advanced theoretical techniques developed for describing one-component charged particle systems, a useful companion volume to this book is Physics of Nonneutral Plasmas by Ronald C Davidson./a

Electron and Ion Optics
Electron and Ion Optics

Author: Miklos Szilagyi

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 550

ISBN-13: 1461309239

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The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.