Etching Compositions and Processes
Author: M. J. Collie
Publisher: William Andrew
Published: 1982
Total Pages: 328
ISBN-13:
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Author: M. J. Collie
Publisher: William Andrew
Published: 1982
Total Pages: 328
ISBN-13:
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Publisher:
Published: 1982
Total Pages: 0
ISBN-13:
DOWNLOAD EBOOKAuthor: Perrin Walker
Publisher: CRC Press
Published: 1990-12-11
Total Pages: 1434
ISBN-13: 9781439822531
DOWNLOAD EBOOKThis publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.
Author: Henry Thomas Alken
Publisher: Kessinger Publishing
Published: 2009-04
Total Pages: 80
ISBN-13: 9781104382643
DOWNLOAD EBOOKThis scarce antiquarian book is a facsimile reprint of the original. Due to its age, it may contain imperfections such as marks, notations, marginalia and flawed pages. Because we believe this work is culturally important, we have made it available as part of our commitment for protecting, preserving, and promoting the world's literature in affordable, high quality, modern editions that are true to the original work.
Author: Barrie D. Dunn
Publisher: Springer
Published: 2015-12-29
Total Pages: 677
ISBN-13: 3319233629
DOWNLOAD EBOOKThe objective of this book is to assist scientists and engineers select the ideal material or manufacturing process for particular applications; these could cover a wide range of fields, from light-weight structures to electronic hardware. The book will help in problem solving as it also presents more than 100 case studies and failure investigations from the space sector that can, by analogy, be applied to other industries. Difficult-to-find material data is included for reference. The sciences of metallic (primarily) and organic materials presented throughout the book demonstrate how they can be applied as an integral part of spacecraft product assurance schemes, which involve quality, material and processes evaluations, and the selection of mechanical and component parts. In this successor edition, which has been revised and updated, engineering problems associated with critical spacecraft hardware and the space environment are highlighted by over 500 illustrations including micrographs and fractographs. Space hardware captured by astronauts and returned to Earth from long durations in space are examined. Information detailed in the Handbook is applicable to general terrestrial applications including consumer electronics as well as high reliability systems associated with aeronautics, medical equipment and ground transportation. This Handbook is also directed to those involved in maximizing the relia bility of new materials and processes for space technology and space engineering. It will be invaluable to engineers concerned with the construction of advanced structures or mechanical and electronic sub-systems.
Author: Perrin Stein
Publisher: Yale University Press
Published: 2013-10-29
Total Pages: 247
ISBN-13: 0300197004
DOWNLOAD EBOOKCatalog of an exhibition held at the Metropolitan Museum of Art, New York, October 1, 2013-January 5, 2014.
Author: Nicolas Posseme
Publisher: Elsevier
Published: 2015-04-14
Total Pages: 123
ISBN-13: 0081005903
DOWNLOAD EBOOKThis is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.This book focuses on back end of line (BEOL) for high performance device realization and presents an overview of all etch challenges for interconnect realization as well as the current etch solutions proposed in the semiconductor industry. The choice of copper/low-k interconnect architecture is one of the keys for integrated circuit performance, process manufacturability and scalability. Today, implementation of porous low-k material is mandatory in order to minimize signal propagation delay in interconnections. In this context, the traditional plasma process issues (plasma-induced damage, dimension and profile control, selectivity) and new emerging challenges (residue formation, dielectric wiggling) are critical points of research in order to control the reliability and reduce defects in interconnects. These issues and potential solutions are illustrated by the authors through different process architectures available in the semiconductor industry (metallic or organic hard mask strategies). Presents the difficulties encountered for interconnect realization in very large-scale integrated (VLSI) circuits Focused on plasma-dielectric surface interaction Helps you further reduce the dielectric constant for the future technological nodes
Author: Michael Köhler
Publisher: John Wiley & Sons
Published: 2008-07-11
Total Pages: 384
ISBN-13: 352761379X
DOWNLOAD EBOOKMicrocomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching processes coming from chemistry, physics, and engineering. The book is divided into two sections: the wet and dry etching processes are presented in the first, general, section, which provides the scientific fundamentals, while a catalog of etching bath composition, etching instructions, and parameters can be found in the second section. This section will enhance the comprehension of the general section and also give an overview of data that are essential in practice.
Author: Philip Gilbert Hamerton
Publisher:
Published: 1871
Total Pages: 122
ISBN-13:
DOWNLOAD EBOOKAuthor: Electrochemical Society. Meeting
Publisher: The Electrochemical Society
Published: 2001
Total Pages: 232
ISBN-13: 9781566773577
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