Proceedings of The...Symposium on Electron, Ion, and Photon Beam Technology
Author:
Publisher:
Published: 1975
Total Pages: 750
ISBN-13:
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Author:
Publisher:
Published: 1975
Total Pages: 750
ISBN-13:
DOWNLOAD EBOOKAuthor: George Brewer
Publisher: Elsevier
Published: 2012-12-02
Total Pages: 377
ISBN-13: 0323153410
DOWNLOAD EBOOKElectron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author:
Publisher:
Published: 1980
Total Pages: 676
ISBN-13:
DOWNLOAD EBOOKAuthor: Ana Cecilia De Azevedo E Souza
Publisher: World Scientific
Published: 1992-04-30
Total Pages: 514
ISBN-13: 9814555355
DOWNLOAD EBOOKThe proceedings contain lectures and contributed papers presented at the Latin American School of Physics in Caxambu, Brazil. Topics are related to a review of collision processes, excitation and ionization of molecules, ion formation by electron impact, mass and energy spectroscopy in collision reactions, desorption induced by ion and electron beams, and principles and applications of synchrotron radiation. The major theme of the school was “Current methods in collision processes.”
Author: E.F. Krimmel
Publisher: Elsevier
Published: 1989-02-01
Total Pages: 744
ISBN-13: 0444596364
DOWNLOAD EBOOKThis symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author: R Newman
Publisher: Elsevier
Published: 2012-12-02
Total Pages: 492
ISBN-13: 0444601287
DOWNLOAD EBOOKMaterials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.
Author: United States. National Bureau of Standards
Publisher:
Published: 1979
Total Pages: 692
ISBN-13:
DOWNLOAD EBOOKAuthor: Joachim Bargon
Publisher: Springer Science & Business Media
Published: 2013-03-09
Total Pages: 367
ISBN-13: 1468448471
DOWNLOAD EBOOKThe papers collected in this volume were presented at the International Symposium on Methods and Materials in Microelectronic Technology. This symposium was sponsored by IBM Germany, and it was held September 29 - October 1, 1982, in Bad Neuenahr, West Germany. The progress of semiconductor and microelectronic technology has become so rapid and the field so sophisticated that it is imperative to exchange the latest insight gained as frequently as it can be accomplished. In addition, it is peculiar for this field that the bulk of the investigations are carried out at industrial research and development laboratories, which makes some of the results less readily accessible. Because of these circumstances, the academic community, which among other things, is supposed to communicate the prog ress in this field to students of different disciplines, finds it rather difficult to stay properly informed. It was the intent of this IBM sponsored symposium to bring together key scientists from academic institutions, primarily from Europe, with principal investigators of the industrial scene. Accordingly, this symposium exposed technologists to scientists and vice versa. Scientific advances often lead directly to technological innovations. In turn, new technologies are often arrived at empirically and, because of that, are initially poorly understood. Scientific inquiry then attempts to probe these processes and phenomena in order to achieve a better understanding. Thus science and technology are intricately interconnected, and it is important that technical exchange between technolo gists and scientists is facilitated, since the problems are typically interdiscipli nary in nature.
Author: Sergej Fatikow
Publisher: Springer Science & Business Media
Published: 2008
Total Pages: 360
ISBN-13: 1846289777
DOWNLOAD EBOOKThis book provides an introduction to robot-based nanohandling. It presents work on the development of a versatile microrobot-based nanohandling robot station inside a scanning electron microscope (SEM). Those unfamiliar with the subject will find the text, which is complemented throughout by the extensive use of illustrations, clear and simple to understand. The author has published two books and numerous papers in the field, and holds more than 50 patents.
Author: W. Dietze
Publisher: Springer Science & Business Media
Published: 1983-12
Total Pages: 680
ISBN-13: 9783540114741
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