Good,No Highlights,No Markup,all pages are intact, Slight Shelfwear,may have the corners slightly dented, may have slight color changes/slightly damaged spine.
Following the successful conference of 1982, DIMETA 88 brought together 170 scientists from 20 countries to discuss and review recent advances in the field.
Diffusion in metals is an important phenomenon, which has many applications, for example in all kinds of steel and aluminum production, and in alloy formation (technical applications e.g. in superconductivity and semiconductor science). In this book the data on diffusion in metals are shown, both in graphs and in equations.Reliable data on diffusion in metals are required by researchers who try to make sense of results from all kinds of metallurgical experiments, and they are equally needed by theorists and computer modelers. The previous compilation dates from 1990, and measurements relying on the electron microprobe and the recent Rutherford backscattering technique were hardly taken into account there.This reference book, containing all results on self-diffusion and impurity diffusion in pure metals with an indication of their reliability, will be useful to everyone in this field for the theory, fundamental research and industrial applications covered.• Up-to-date and complete (including EPMA and RBS investigations)• Indication of reliability of the measurements• Reassessment of many early results• Data can easily be extracted from Tables and Graphs
This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.