Dielectric and Optical Properties of Sputtered Thin Films
Dielectric and Optical Properties of Sputtered Thin Films

Author: A. R Tanguay (Jr)

Publisher:

Published: 1984

Total Pages: 135

ISBN-13:

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Of critical importance to the eventual performance of numerous coherent optical image processors and highly parallel computers is the development of a high speed, recyclable, linear, high resolution, selectively erasable image storage transducer operable in nearly real time. Applications for such a transducer abound, including incoherent-to-coherent conversion, pattern recognition and image feature extraction, level slicing, edge enhancement, low light level image integration, scratch pad memory, and page composition for data entry in holographic memory systems. In response to this need, a wide variety of candidate devices have been proposed in the past ten years, based on photochromic, liquid crystal, photorefractive, magnetooptic, electrooptic, deformable membrane, thermoplastic, photodichroic, and ambidextrous effects in numerous configurations. The device category comprised of Electrooptic Spatial Light Modulators contains a number of leading candidates, due to a combination of wide dynamic range, high sensitivity, intermediate storage time, relative simplicity of construction and operation, and long term durability. This category includes the Pockels Readout Optical Modulator or PROM, a Soviet modification of th PROM called the PRIZ, the Microchannel Spatial Light Modulator, the TITUS and photo-TITUS, and the Photorefractive Incoherent-to-Coherent Optical Converter.

An Investigation of Electrical and Optical Properties of Sputtered Amorphous Silicon Nitride and Germanium Thin Films
An Investigation of Electrical and Optical Properties of Sputtered Amorphous Silicon Nitride and Germanium Thin Films

Author: Rajendra S. Khandelwal

Publisher:

Published: 1987

Total Pages: 246

ISBN-13:

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Low temperature preparation of thin amorphous Silicon Nitride and Germanium Films by direct RF sputter deposition was investigated. Influence of various sputtering parameters on film properties was studied. Infrared transmission spectrophotometry was used to evaluate optical properties of the films whereas electrical characteristics of the films were determined from current-voltage measurements of MIS structures. For Silicon Nitride films it was observed that the stoichiometry, as indicated by the IR transmission, dielectric constant and current density versus square root of electric field measurements, was a strong function of the sputtering gas composition and particularly the Ar/N ratio in the sputtering gas. It was established from the current-voltage relationship that the dominant conduction mechanism in these films is of PooleFrenkel type. The current-voltage characteristics of the MIS devices were observed to be independent of the electrode material, device area and the film thickness. It is concluded that the insulating films thus deposited were comparable to those deposited using any other deposition method and is anticipated that due to the low deposition temperatures, sputtering may emerge as a highly potential process for optoelectronic device passivation.

Optical Properties of Thin Solid Films
Optical Properties of Thin Solid Films

Author: O. S. Heavens

Publisher: Courier Corporation

Published: 1991

Total Pages: 290

ISBN-13: 9780486669243

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Authoritative reference treats the formation, structure, optical properties, and uses of thin solid films, emphasizing causes of their unusual qualities. 162 figures. 19 tables. 1955 edition.

Physics of Thin Films
Physics of Thin Films

Author: Maurice H. Francombe

Publisher: Elsevier

Published: 2013-10-22

Total Pages: 385

ISBN-13: 1483144933

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Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects are also considered. The next chapter examines studies on size-dependent electrical conduction in thin metal films and wires, paying particular attention to both classical and quantum size effects and some of the anisotropic characteristics of epitaxial metal films. The reader is then introduced to the optical properties of metal films and interactions in multilayer magnetic films. This text concludes with a chapter that looks at diffusion in metallic films and presents experimental results for phase-forming systems, miscible systems, and lateral diffusion. This monograph will be of value to students and practitioners of physics, especially those interested in thin films.

Thin Film Materials Technology
Thin Film Materials Technology

Author: Kiyotaka Wasa

Publisher: William Andrew

Published: 2004-05-10

Total Pages: 533

ISBN-13: 0815519311

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An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.