Advanced Computational and Design Techniques in Applied Electromagnetic Systems

Advanced Computational and Design Techniques in Applied Electromagnetic Systems

Author: S.-Y. Hahn

Publisher: Elsevier

Published: 2013-10-22

Total Pages: 766

ISBN-13: 1483290565

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This symposium was concerned with advanced computational and design techniques in applied electromagnetic systems including devices and materials. The scope of the proceedings cover a wide variety of topics in applied electromagnetic fields: optimal design techniques and applications, inverse problems, advanced numerical techniques, mechanism and dynamics of new actuators, physics and applications of magnetic levitation, electromagnetic propulsion and superconductivity, modeling and applications of magnetic fluid, plasma and arc discharge, high-frequency field computations, electronic device simulations and magnetic materials.


The Finite Element Method in Charged Particle Optics

The Finite Element Method in Charged Particle Optics

Author: Anjam Khursheed

Publisher: Springer Science & Business Media

Published: 1999-09-30

Total Pages: 314

ISBN-13: 9780792386117

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"A new and comprehensive approach to the subject is taken. The finite element method is placed within a wider framework than strictly charged particle optics. Concepts developed in fluid flow and structural analysis, not hitherto used in charged particle optics, are presented. Benchmark test results provide a way of comparing the finite element method to other field solving methods. The book also reports on some high-order interpolation techniques and mesh generation methods that will be of interest to other finite element researchers."--Jacket.


Magnetic Electron Lenses

Magnetic Electron Lenses

Author: P.W. Hawkes

Publisher: Springer Science & Business Media

Published: 2013-11-11

Total Pages: 474

ISBN-13: 3642815162

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No single volume has been entirely devoted to the properties of magnetic lenses, so far as I am aware, although of course all the numerous textbooks on electron optics devote space to them. The absence of such a volume, bringing together in formation about the theory and practical design of these lenses, is surprising, for their introduction some fifty years ago has created an entirely new family of commercial instruments, ranging from the now traditional transmission electron microscope, through the reflection and transmission scanning microscopes, to co lumns for micromachining and microlithography, not to mention the host of experi mental devices not available commercially. It therefore seemed useful to prepare an account of the various aspects of mag netic lens studies. These divide naturally into the five chapters of this book: the theoretical background, in which the optical behaviour is described and formu lae given for the various aberration coefficients; numerical methods for calculat ing the field distribution and trajectory tracing; extensive discussion of the paraxial optical properties and aberration coefficients of practical lenses, il lustrated with curves from which numerical information can be obtained; a comple mentary account of the practical, engineering aspects of lens design, including permanent magnet lenses and the various types of superconducting lenses; and final ly, an up-to-date survey of several kinds of highly unconventional magnetic lens, which may well change the appearance of future electron optical instruments very considerably after they cease to be unconventional.


Aberration Theory in Electron and Ion Optics

Aberration Theory in Electron and Ion Optics

Author: Peter W. Hawkes

Publisher: Elsevier

Published: 2023-06-02

Total Pages: 376

ISBN-13: 0443193215

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Advances in Imaging and Electron Physics, Volume 227 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. - Provides the authority and expertise of leading contributors from an international board of authors - Presents the latest release in the Advances in Imaging and Electron Physics series


Microlithography

Microlithography

Author: Bruce W. Smith

Publisher: CRC Press

Published: 2018-10-03

Total Pages: 864

ISBN-13: 1420051539

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This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.