Chemical Beam Epitaxy and Related Techniques
Chemical Beam Epitaxy and Related Techniques

Author: John S. Foord

Publisher: John Wiley & Sons

Published: 1997-12-08

Total Pages: 472

ISBN-13:

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Chemical Beam Epitaxy (CBE), is a powerful growth technique which has come to prominence over the last ten years. Together with the longer established molecular beam epitaxy (MBE) and metal organic vapour phase epitaxy (MOVPE), CBE provides a capability for the epitaxial growth of semiconductor and other advanced materials with control at the atomic limit. This, the first book dedicated to CBE, and closely related techniques comprises chapters by leading research workers in the field and provides a detailed overview of the state-of-the-art in this area of semiconductor technology. Topics covered include equipment design and safety considerations, design of chemical precursors, surface chemistry and growth mechanisms, materials and devices from arsenide, phosphide, antimonide, silicon and II-VI compounds, doping, selected area epitaxy and etching. The volume provides an introduction for those new to the field and a detailed summary for experienced researchers.

InP-Based Materials and Devices
InP-Based Materials and Devices

Author: Osamu Wada

Publisher: Wiley-Interscience

Published: 1999-04-13

Total Pages: 616

ISBN-13:

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A comprehensive guide to current techniques, applications, and trends in InP-based technologies. Introducing one of the hottest technologies in the semiconductor industry, this collection of articles by international leading experts covers the state of the art of indium phosphide (InP)-based materials and devices. From current industry practices to cutting-edge developments to promising research trends, each chapter describes a particular aspect of the technology, giving scientists and engineers the necessary information, including physical principles and technical know-how, to design, apply, and troubleshoot these high-performance, low-cost components for diverse systems-TDM and WDM optical systems or microwave and millimeter-wave systems. The advantages and challenges still to overcome of InP-based semiconductors as compared with the more mature GaAs technology are also thoroughly reviewed. Presented in an easy-to-understand tutorial style, with topics cross-referenced between chapters, InP-Based Materials and Devices features more than 1,500 references as well as 365 figures and tables. Key topics include: * Basic materials physics involved in a wide range of InP-based compounds. * Growth of high-purity bulk and heterostructure epitaxy, including MOCVD, MBE, and GS-MBE. * Hetero-interface control and dry process techniques for device fabrication. * High-performance heterojunction-FETs and HEMTs as well as HBTs for high-speed IC and MMIC applications. * Lasers, amplifiers, and modulators as well as photodiodes and receivers for high-speed and WDM networks. * Optoelectronic integration and packing for functional, low-cost modules.

Springer Handbook of Nanotechnology
Springer Handbook of Nanotechnology

Author: Bharat Bhushan

Publisher: Springer

Published: 2017-11-05

Total Pages: 1704

ISBN-13: 3662543575

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This comprehensive handbook has become the definitive reference work in the field of nanoscience and nanotechnology, and this 4th edition incorporates a number of recent new developments. It integrates nanofabrication, nanomaterials, nanodevices, nanomechanics, nanotribology, materials science, and reliability engineering knowledge in just one volume. Furthermore, it discusses various nanostructures; micro/nanofabrication; micro/nanodevices and biomicro/nanodevices, as well as scanning probe microscopy; nanotribology and nanomechanics; molecularly thick films; industrial applications and nanodevice reliability; societal, environmental, health and safety issues; and nanotechnology education. In this new edition, written by an international team of over 140 distinguished experts and put together by an experienced editor with a comprehensive understanding of the field, almost all the chapters are either new or substantially revised and expanded, with new topics of interest added. It is an essential resource for anyone working in the rapidly evolving field of key technology, including mechanical and electrical engineers, materials scientists, physicists, and chemists.

Heterostructure Epitaxy and Devices - HEAD’97
Heterostructure Epitaxy and Devices - HEAD’97

Author: Peter Kordos

Publisher: Springer Science & Business Media

Published: 1998-03-31

Total Pages: 342

ISBN-13: 9780792350125

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The Workshop Heterostructure Epitaxy and Devices HEAD'97 was held from October 12 to 16, 1997 at Smolenice Castle, the House of Scientists of the Slovak Academy of Sciences and was co-organized by the Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava and the Institute of Thin Film and Ion Technology, Research Centre, liilich. It was the third in a series of workshops devoted to topics related to heterostructure epitaxy and devices and the second included into the category of Advanced Research Workshops (ARW) under sponsorship of the NATO. More than 70 participants from 15 countries attended (Austria, Belarus, Belgium, Czech Republic, Finland, Germany, Greece, Hungary, Italy, Poland, Russia, Slovakia, Ukraine, the United Kingdom and the USA). Novel microelectronic and optoelectronic devices are based on semiconductor heterostructures. The goal of the ARW HEAD'97 was to discuss various questions related to the use of new materials (e.g. compound semiconductors based on high band-gap nitrides and low band-gap antimonides) and new procedures (low-temperature epitaxial growth), as well as new principles (nanostructures, quantum wires and dots, etc.) aimed at realizing high-performance heterostructure based electronic devices. Almost 70 papers (invited and contributed oral presentations as well as posters) were presented at the ARW HEAD'97 and the main part of them is included into these Proceedings.

Organometallic Vapor-Phase Epitaxy
Organometallic Vapor-Phase Epitaxy

Author: Gerald B. Stringfellow

Publisher: Elsevier

Published: 1999-03-04

Total Pages: 599

ISBN-13: 0080538185

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Organometallic Vapor-Phase Epitaxy describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices. - Updated with new emphasis on the semiconducting nitride materials—GaN and its alloys with In and Al - Emphasizes the newly understood aspects of surface processes - Contains a new chapter, as well as several new sections in chapters on thermodynamics and kinetics

Long-Wavelength Infrared Semiconductor Lasers
Long-Wavelength Infrared Semiconductor Lasers

Author: Hong K. Choi

Publisher: John Wiley & Sons

Published: 2004-03-18

Total Pages: 418

ISBN-13: 9780471392002

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Long-wavelength Infrared Semiconductor Lasers provides a comprehensive review of the current status of semiconductor coherent sources emitting in the mid-to far-infrared spectrum and their applications. It includes three topics not covered in any previous book: far-infrared emission from photo-mixers as well as from hot-hole lasers, and InP-based lasers emitting beyond two micrometers. Semiconductor lasers emitting at more than two micrometers have many applications such as in trace gas analysis, environmental monitoring, and industrial process control. Because of very rapid progress in recent years, until this book no comprehensive information beyond scattered journal articles is available at present.

CVD of Compound Semiconductors
CVD of Compound Semiconductors

Author: Anthony C. Jones

Publisher: John Wiley & Sons

Published: 2008-11-20

Total Pages: 352

ISBN-13: 3527614621

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Chemical growth methods of electronic materials are the keystone of microelectronic device processing. This book discusses the applications of metalorganic chemistry for the vapor phase deposition of compound semiconductors. Vapor phase methods used for semiconductor deposition and the materials properties that make the organometallic precursors useful in the electronics industry are discussed for a variety of materials. Topics included: * techniques for compound semiconductor growth * metalorganic precursors for III-V MOVPE * metalorganic precursors for II-VI MOVPE * single-source precursors * chemical beam epitaxy * atomic layer epitaxy Several useful appendixes and a critically selected, up-to-date list of references round off this practical handbook for materials scientists, solid-state and organometallic chemists, and engineers.

Springer Handbook of Robotics
Springer Handbook of Robotics

Author: Bruno Siciliano

Publisher: Springer

Published: 2016-07-27

Total Pages: 2259

ISBN-13: 3319325523

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The second edition of this handbook provides a state-of-the-art overview on the various aspects in the rapidly developing field of robotics. Reaching for the human frontier, robotics is vigorously engaged in the growing challenges of new emerging domains. Interacting, exploring, and working with humans, the new generation of robots will increasingly touch people and their lives. The credible prospect of practical robots among humans is the result of the scientific endeavour of a half a century of robotic developments that established robotics as a modern scientific discipline. The ongoing vibrant expansion and strong growth of the field during the last decade has fueled this second edition of the Springer Handbook of Robotics. The first edition of the handbook soon became a landmark in robotics publishing and won the American Association of Publishers PROSE Award for Excellence in Physical Sciences & Mathematics as well as the organization’s Award for Engineering & Technology. The second edition of the handbook, edited by two internationally renowned scientists with the support of an outstanding team of seven part editors and more than 200 authors, continues to be an authoritative reference for robotics researchers, newcomers to the field, and scholars from related disciplines. The contents have been restructured to achieve four main objectives: the enlargement of foundational topics for robotics, the enlightenment of design of various types of robotic systems, the extension of the treatment on robots moving in the environment, and the enrichment of advanced robotics applications. Further to an extensive update, fifteen new chapters have been introduced on emerging topics, and a new generation of authors have joined the handbook’s team. A novel addition to the second edition is a comprehensive collection of multimedia references to more than 700 videos, which bring valuable insight into the contents. The videos can be viewed directly augmented into the text with a smartphone or tablet using a unique and specially designed app. Springer Handbook of Robotics Multimedia Extension Portal: http://handbookofrobotics.org/