High Density Plasma Sources
High Density Plasma Sources

Author: Oleg A. Popov

Publisher: Elsevier

Published: 1996-12-31

Total Pages: 467

ISBN-13: 0815517890

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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Plasma Sources for Thin Film Deposition and Etching
Plasma Sources for Thin Film Deposition and Etching

Author: Maurice H. Francombe

Publisher: Academic Press

Published: 2013-10-22

Total Pages: 343

ISBN-13: 0080925138

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This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. - Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed - Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils - Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology - Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination

Potential Applications of an Electron Cyclotron Resonance Multicusp Plasma Source
Potential Applications of an Electron Cyclotron Resonance Multicusp Plasma Source

Author:

Publisher:

Published: 1990

Total Pages: 15

ISBN-13:

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An electric cyclotron resonance (ECR) multicusp plasmatron has been developed by feeding a multicusp bucket arc chamber with a compact ECR plasma source. This novel source produces large (about 25-cm- diam), uniform (to within {plus minus}10%), dense (>1011--cm{sup -3}) plasmas of argon, helium, hydrogen, and oxygen. It has been operated to produce an oxygen plasma for etching 12.7-cm (5-in.) positive photoresist-coated silicon wafers with uniformity within {plus minus}8%. Following a brief review of the large plasma source developed at Oak Ridge National Laboratory, the configuration and operation of the source are described and a discharge model is presented. Results from this new ECR plasma source and potential applications for plasma processing of thin films are discussed. 21 refs., 10 figs.

Compact Plasma and Focused Ion Beams
Compact Plasma and Focused Ion Beams

Author: Sudeep Bhattacharjee

Publisher: Taylor & Francis

Published: 2013-12-12

Total Pages: 390

ISBN-13: 1466557923

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Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ran

The Physics and Technology of Ion Sources
The Physics and Technology of Ion Sources

Author: Ian G. Brown

Publisher: John Wiley & Sons

Published: 2006-03-06

Total Pages: 396

ISBN-13: 3527604545

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The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.