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Author: United States. National Bureau of Standards. Library Division
Publisher:
Published: 1977
Total Pages: 246
ISBN-13:
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Author: United States. National Bureau of Standards. Library Division
Publisher:
Published: 1977
Total Pages: 246
ISBN-13:
DOWNLOAD EBOOKAuthor: Thorsten Lill
Publisher: John Wiley & Sons
Published: 2021-06-28
Total Pages: 306
ISBN-13: 3527346686
DOWNLOAD EBOOKLearn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Author: L. I. Levin
Publisher: Taylor & Francis
Published: 1990
Total Pages: 158
ISBN-13: 9783718648993
DOWNLOAD EBOOKFirst published in 1990. Routledge is an imprint of Taylor & Francis, an informa company.
Author: Sean Johnston
Publisher: Oxford University Press
Published: 2012-04-26
Total Pages: 326
ISBN-13: 9780199692118
DOWNLOAD EBOOKThis account tracks the Allied atomic energy experts who emerged from the Manhattan Project to explore optimistic but distinct paths in the USA, UK and Canada. Characterized successively as admired atomic scientists, mistrusted spies and heroic engineers, their identities were ultimately shaped by nuclear accidents.
Author: Argonne National Laboratory. Library Services Department
Publisher:
Published: 1966
Total Pages: 236
ISBN-13:
DOWNLOAD EBOOKAuthor: National Library of Medicine (U.S.)
Publisher:
Published: 1962
Total Pages: 520
ISBN-13:
DOWNLOAD EBOOKAuthor: United States. Public Health Service
Publisher:
Published: 1962
Total Pages: 532
ISBN-13:
DOWNLOAD EBOOKAuthor: United States. Congress. Joint Committee on Atomic Energy
Publisher:
Published: 1946
Total Pages: 1222
ISBN-13:
DOWNLOAD EBOOKAuthor: U.S. Atomic Energy Commission
Publisher:
Published: 1962
Total Pages: 1202
ISBN-13:
DOWNLOAD EBOOKAuthor: U.S. Atomic Energy Commission
Publisher:
Published: 1960
Total Pages: 1834
ISBN-13:
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