Alternative Lithography
Alternative Lithography

Author: Clivia M. Sotomayor Torres

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 343

ISBN-13: 1441992049

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Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.

Principles of Lithography
Principles of Lithography

Author: Harry J. Levinson

Publisher: SPIE Press

Published: 2005

Total Pages: 446

ISBN-13: 9780819456601

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Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Fundamentals of Terahertz Devices and Applications
Fundamentals of Terahertz Devices and Applications

Author: Dimitris Pavlidis

Publisher: John Wiley & Sons

Published: 2021-08-02

Total Pages: 580

ISBN-13: 1119460719

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An authoritative and comprehensive guide to the devices and applications of Terahertz technology Terahertz (THz) technology relates to applications that span in frequency from a few hundred GHz to more than 1000 GHz. Fundamentals of Terahertz Devices and Applications offers a comprehensive review of the devices and applications of Terahertz technology. With contributions from a range of experts on the topic, this book contains in a single volume an inclusive review of THz devices for signal generation, detection and treatment. Fundamentals of Terahertz Devices and Applications offers an exploration and addresses key categories and aspects of Terahertz Technology such as: sources, detectors, transmission, electronic considerations and applications, optical (photonic) considerations and applications. Worked examplesbased on the contributors extensive experience highlight the chapter material presented. The text is designed for use by novices and professionals who want a better understanding of device operation and use, and is suitable for instructional purposes This important book: Offers the most relevant up-to-date research information and insight into the future developments in the technology Addresses a wide-range of categories and aspects of Terahertz technology Includes material to support courses on Terahertz Technology and more Contains illustrative worked examples Written for researchers, students, and professional engineers, Fundamentals of Terahertz Devices and Applications offers an in-depth exploration of the topic that is designed for both novices and professionals and can be adopted for instructional purposes.

Integrated Nanodevice and Nanosystem Fabrication
Integrated Nanodevice and Nanosystem Fabrication

Author: Simon Deleonibus

Publisher: CRC Press

Published: 2017-11-22

Total Pages: 306

ISBN-13: 135172178X

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Since its invention, the integrated circuit has necessitated new process modules and numerous architectural changes to improve application performances, power consumption, and cost reduction. Silicon CMOS is now well established to offer the integration of several tens of billions of devices on a chip or in a system. At present, there are important challenges in the introduction of heterogeneous co-integration of materials and devices with the silicon CMOS 2D- and 3D-based platforms. New fabrication techniques allowing strong energy and variability efficiency come in as possible players to improve the various figures of merit of fabrication technology. Integrated Nanodevice and Nanosystem Fabrication: Breakthroughs and Alternatives is the second volume in the Pan Stanford Series on Intelligent Nanosystems. The book contains 8 chapters and is divided into two parts, the first of which reports breakthrough materials and techniques such as single ion implantation in silicon and diamond, graphene and 2D materials, nanofabrication using scanning probe microscopes, while the second tackles the scaling and architectural aspects of silicon devices through HiK scaling for nanoCMOS, nanoscale epitaxial growth of group IV semiconductors, design for variability co-optimization in SOI FinFETs, and nanowires for CMOS and diversifications.

Materials and Processes for Next Generation Lithography
Materials and Processes for Next Generation Lithography

Author:

Publisher: Elsevier

Published: 2016-11-08

Total Pages: 636

ISBN-13: 0081003587

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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place

Fundamentals and Applications of Nanomaterials
Fundamentals and Applications of Nanomaterials

Author: Zhen Guo

Publisher: Artech House

Published: 2009

Total Pages: 268

ISBN-13: 1596932635

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Supported by over 90 illustrations, this timely resource offers you a broad introduction to nanomaterials, covering basic principles, technology, and cutting-edge applications. From quantum mechanics, band structure, surface chemistry, thermodynamics, and kinetics of nanomaterials, to nanomaterial characterization, nanoparticle synthesis, nanoelectronics, NEMS, and Nano-Bio materials, this groundbreaking volume offers you a solid understanding of a wide range of fundamental topics and brings you up-to-date with the latest developments in the field.

Integrated Circuit Fabrication
Integrated Circuit Fabrication

Author: Shubham Kumar

Publisher: CRC Press

Published: 2021-04-28

Total Pages: 353

ISBN-13: 1000396401

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This book covers theoretical and practical aspects of all major steps in the fabrication sequence. This book can be used conveniently in a semester length course on integrated circuit fabrication. This text can also serve as a reference for practicing engineer and scientist in the semiconductor industry. IC Fabrication are ever demanding of technology in rapidly growing industry growth opportunities are numerous. A recent survey shows that integrated circuit currently outnumber humans in UK, USA, India and China. The spectacular advances in the development and application of integrated circuit technology have led to the emergence of microelectronic process engineering as an independent discipline. Integrated circuit fabrication text books typically divide the fabrication sequence into a number of unit processes that are repeated to form the integrated circuit. The effect is to give the book an analysis flavor: a number of loosely related topics each with its own background material. Note: T& F does not sell or distribute the Hardback in India, Pakistan, Nepal, Bhutan, Bangladesh and Sri Lanka.

Self-Cleaning of Surfaces and Water Droplet Mobility
Self-Cleaning of Surfaces and Water Droplet Mobility

Author: Bekir Sami Yilbas

Publisher: Elsevier

Published: 2019-04-25

Total Pages: 456

ISBN-13: 0128147776

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Self-Cleaning of Surfaces and Water Droplet Mobility deals with the self-cleaning of hydrophobic surfaces. Chapters cover the basics of wetting states of fluids and surface characteristics in terms of texture topology and free energy. The self-cleaning aspects of surfaces, such as various synthesizing and fabrication processes are then introduced and discussed, along with environmental dust properties, including elemental compositions, particle sizes and shapes, and their chemo-mechanics characteristics. In addition, mud formation in humid air, as well as ambient and dry mud adhesion on optically transparent surfaces is explored, as is water droplet dynamics on hydrophilic and hydrophobic surfaces, amongst other topics. The book fills the gap between the physical fundamentals of surface energy and texture characteristics for practical applications of surface cleaning and provides a basic understanding of the self-cleaning of surfaces that will be idea for academics, researchers and students. - Showcases the fundamental aspects of the self-cleaning of surfaces - Includes practical applications in energy and other sectors - Contains a review of the characterization of environmental dust on hydrophilic and hydrophobic surfaces - Discusses the fabrication and optimization of surfaces towards self-cleaning - Presents practical applications of the self-cleaning of surfaces via water droplet mobility

Handbook of Semiconductor Manufacturing Technology
Handbook of Semiconductor Manufacturing Technology

Author: Yoshio Nishi

Publisher: CRC Press

Published: 2017-12-19

Total Pages: 3276

ISBN-13: 1351829823

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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.