X-Rays and Extreme Ultraviolet Radiation
X-Rays and Extreme Ultraviolet Radiation

Author: David Attwood

Publisher: Cambridge University Press

Published: 2017-02-16

Total Pages:

ISBN-13: 1316810666

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With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.

Soft X-Rays and Extreme Ultraviolet Radiation
Soft X-Rays and Extreme Ultraviolet Radiation

Author: David Attwood

Publisher: Cambridge University Press

Published: 2007-02-22

Total Pages: 611

ISBN-13: 1139643428

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This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

Advanced Radiation Sources and Applications
Advanced Radiation Sources and Applications

Author: Helmut Wiedemann

Publisher: Springer Science & Business Media

Published: 2005-12-08

Total Pages: 452

ISBN-13: 9781402034480

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A NATO Advanced Research Workshop on ”Advanced Radiation Sources and Applications” was held from August 29 to September 2, 2004. Hosted by the Yerevan Physics Institute, Yerevan, Armenia, 30 invited researchers from former Soviet Union and NATO countries gathered at Nor-Hamberd, Yerevan, on the slopes of Mount Aragats to discuss recent theoretical as well as expe- mental developments on means of producing photons from mostly low energy electrons. Thismeetingbecamepossiblethroughthegenerousfundingprovidedbythe NATO Science Committee and the programme director Dr. Fausto Pedrazzini in the NATO Scienti?c and Environmental Affairs Division. The workshop - rectors were Robert Avakian, Yerevan Physics Institute, Armenia and Helmut Wiedemann, Stanford (USA). Robert Avakian provided staff, logistics and - frastructure from the Yerevan Physics institute to assure a smooth execution of the workshop. Special thanks goes to Mrs. Ivetta Keropyan for admin- trative and logistics support to foreign visitors. The workshop was held at the institute’s resort in Nor-Hamberd on the slopes of Mount Aragats not far from the Yerevan cosmic ray station. The isolation and peaceful setting of the resort provided the background for a fruitful week of presentations and discussions. Following our invitations, 38 researchers in this ?eld came to the workshop from Armenia, Belarus, Romania, Russia, Ukraine, Denmark, France, G- many and the USA. Commuting from Yerevan local scientists joined the daily presentations. Over a ?ve day period 40 presentations were given.

Radiation characteristics of extreme UV and soft X-ray sources
Radiation characteristics of extreme UV and soft X-ray sources

Author: Tobias Mey

Publisher: Göttingen University Press

Published: 2015

Total Pages: 154

ISBN-13: 3863952111

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Electromagnetic radiation in the extreme UV and soft x-ray spectral range is of steadily increasing importance in fundamental research and industrial applications. An optimum use of the available photons can only be achieved under condition of a comprehensive beam characterization. Following that goal, this work addresses the pathway of extreme UV and soft x-ray radiation from its generation, through the beam transport by the beamline to the probe position. Experimentally, those aspects are optimized at a laser-produced plasma source and at an arrangement for the generation of high-harmonics. Additionally, the coherence of laser beams is analyzed by measurements of the Wigner distribution function. This method is applied to the photon beam of the free-electron laser FLASH, resulting in the entire characterization of its propagation properties.

EUV Sources for Lithography
EUV Sources for Lithography

Author: Vivek Bakshi

Publisher: SPIE Press

Published: 2006

Total Pages: 1104

ISBN-13: 9780819458452

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This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

Soft X-Rays and Extreme Ultraviolet Radiation
Soft X-Rays and Extreme Ultraviolet Radiation

Author: David T. Attwood

Publisher:

Published: 2014-05-14

Total Pages: 488

ISBN-13: 9781139648936

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This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.