Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Coatings offer the unique opportunity to create architectures that combine the functionality of two or more materials, conferring unique properties to objects with an extremely large palette of solutions. For this flexibility, thick and thin films have terrific impacts on the most relevant societal challenges. Computers, food packaging, airplanes, and cars, to mention a few familiar objects from everyday life, rely heavily on coatings. To celebrate the key role that coatings have in society, and in science and technology, this book collects a selection of relevant reviews and original research articles published in “Coatings” in 2017 and 2018. Papers have been selected based on their broad impact and balancing between the two major aspects of coatings science and technology: deposition and characterization.
Thin Film Coatings: Properties, Deposition, and Applications discusses the holistic subject of conventional and emerging thin film technologies without bias to a specific technology based on the existing literature. It covers properties and delves into the various methods of thin film deposition, including the most recent techniques and a direction for future developments. It also discusses the cutting-edge applications of thin film coatings such as self-healing and smart coatings, biomedical, hybrid, and scalable thin films. Finally, the concept of Industry 4.0 in thin film coating technology is examined. This book: Explores a wide range and is not specific to material and method of deposition Demonstrates the application of thin film coatings in nearly all sectors, such as energy and anti-microbial applications Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications Provides detailed bibliometric analyses on applications of thin film coatings Discusses Industry 4.0 and 3D printing in thin film technology With its broad coverage, this comprehensive reference will appeal to a wide audience of materials scientists and engineers and others studying and developing advanced thin film technologies.
Nanomaterials are important tools for enabling technological progress as they can provide dramatically different properties as compared to the bulk counterparts. The field of nanoparticles is one of the most investigated within nanomaterials, thanks to the existing, relatively simple, means of manufacturing. In this thesis, high-power pulsed hollow cathode sputtering is used to nucleate and grow magnetic nanoparticles in a plasma. This sputtering technique provides a high degree of ionization of the sputtered material, which has previously been shown to aid in the growth of the nanoparticles. The magnetic properties of the particles are utilized and makes it possible for the grown particles to act as building blocks for self-assembly into more sophisticated nano structures, particularly when an external magnetic field is applied. These structures created are termed “nanowires” or “nanotrusses”, depending on the level of branching and inter-linking that occurs. Several different elements have been investigated in this thesis. In a novel approach, it is shown how nanoparticles with more advanced structures, and containing material from two hollow cathodes, can be fabricated using high-power pulses. The dual-element particles are achieved by using two distinct and individual elemental cathodes, and a pulse process that allows tuning of individual pulses separately to them. Nanoparticles grown and investigated are Fe, Ni, Pt, Fe-Ni and Ni-Pt. Alternatively, the addition of oxygen to the process allows the formation of oxide or hybrid metal oxide – metal particles. For all nanoparticles containing several elements, it is demonstrated that the stoichiometry can be easily varied, either by the amount of reactive gas let into the process or by tuning the amount of sputtered material through adjusting the electric power supplied to the different cathodes. One aim of the presented work is to find a suitable material for the use as a catalyst in the production of H2 gas through the process of water splitting. H2 is a good candidate to replace fossil fuels as an energy carrier. However, rare elements (such as Ir or Pt) needs to be used as the catalyst, otherwise a high overpotential is required for the splitting to occur, leading to a low efficiency. This work demonstrates a possible route to avoid this, by using nanomaterials to increase the surface-to-volume ratio, as well as optimizing the elemental ratio between different materials to lower the amount of noble elements required.
This book provides both researchers in the academia, students, and industrial experts the chance to exchange new ideas, build relations, and find virtual partners. It is a scientific event whose proceedings have set a very high standard. ICORSE’s distinctive feature is represented by its breadth of topics: mechatronics, integronics and adaptronics; reliable systems engineering; cyber-physical systems; optics; theoretical and applied mechanics; robotics; modelling and simulation; smart integrated control systems; computer imaging processing; smart bio-medical and bio-mechatronic systems; MEMS and NEMS; new materials; sensors and transducers; nano-chemistry, physical chemistry of biological systems; micro- and nanotechnology; system optimization; communications, renewable energy and environmental engineering. They all come together to deliver a clear picture of the state of the art reached in these areas so far.
This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
In ten volumes, this unique handbook covers all fundamental aspects of surface and interface science and offers a comprehensive overview of this research area for scientists working in the field, as well as an introduction for newcomers. Volume 1: Concepts and Methods Volume 2: Properties of Elemental Surfaces Volume 3: Properties of Composite Surfaces: Alloys, Compounds, Semiconductors Volume 4: Solid-Solid Interfaces and Thin Films Volume 5: Solid-Gas Interfaces I Volume 6: Solid-Gas Interfaces II Volume 7: Liquid and Biological Interfaces Volume 8: Interfacial Electrochemistry Volume 9: Applications of Surface Science I Volume 10: Applications of Surface Science II Content of Volumes 8 & 9: * Surface Analytics with X-Ray Photoelectron and Auger Electron Spectroscopy on Coated Steel Sheets * Applications of Graphene * Industrial Heterogeneous Catalysis * Automotive Catalysis * High-Throughput Heterogeneous Catalyst Research, Development, Scale-Up, and Production Support * Industrial Separation of Insulating Particles: Triboelectric Charging * Friction: Friend and Foe * Surface Science and Flotation * Application of Surface Science to Corrosion * Electrons, Electrodes, and the Transformation of Organic Molecules * Self-Cleaning Surfaces: From Fundamental Aspect to Real Technical Applications * Thin Films: Sputtering, PVD Methods and Applications * Wafer Bonding * Superconformal Deposition * Spintronics: Surface and Interface Aspects * Device Efficiency of Organic Light-Emitting Diodes * Dye-Sensitized Solar Cells * Electronic Nose: Current Status and Future Trends * Surface Science in Batteries * Surface and Interface Science in Fuel Cells Research
Hard or protective coatings are widely used in conventional and modern industries and will continue to play a key role in future manufacturing, especially in the micro and nano areas. Protective Thin Coatings Technology highlights the developments and advances in the preparation, characterization, and applications of protective micro-/nanoscaled films and coatings. This book Covers technologies for sputtering of flexible hard nanocoatings, deposition of solid lubricating films, and multilayer transition metal nitrides Describes integrated nanomechanical characterization of hard coatings, corrosion and tribo-corrosion of hard coatings, and high entropy alloy films and coatings Investigates thin films and coatings for high-temperature applications, nanocomposite coatings on magnesium alloys, and the correlation between coating properties and industrial applications Features various aspects of hard coatings, covering advanced sputtering technologies, structural characterizations, and simulations, as well as applications This first volume in the two-volume set, Protective Thin Coatings and Functional Thin Films Technology, will benefit industry professionals and researchers working in areas related to semiconductors, optoelectronics, plasma technology, solid-state energy storages, and 5G, as well as advanced students studying electrical, mechanical, chemical, and material engineering.
