This volume treats new materials (nanotubes and quantum dots) and new techniques (synchrotron radiation scattering and cavity confined scattering). In the past five years, Raman and Brillouin scattering have taken a place among the most important research and characterization methods for carbon nanotubes. Among the novel techniques discussed in this volume are those employing synchrotron radiation as a light source.
This volume collects the proceedings of the 23rd International Course of Crystallography, entitled "X-ray and Neutron Dynamical Diffraction, Theory and Applications," which took place in the fascinating setting of Erice in Sicily, Italy. It was run as a NATO Advanced Studies Institute with A. Authier (France) and S. Lagomarsino (Italy) as codirectors, and L. Riva di Sanseverino and P. Spadon (Italy) as local organizers, R. Colella (USA) and B. K. Tanner (UK) being the two other members of the organizing committee. It was attended by about one hundred participants from twenty four different countries. Two basic theories may be used to describe the diffraction of radiation by crystalline matter. The first one, the so-called geometrical, or kinematical theory, is approximate and is applicable to small, highly imperfect crystals. It is used for the determination of crystal structures and describes the diffraction of powders and polycrystalline materials. The other one, the so-called dynamical theory, is applicable to perfect or nearly perfect crystals. For that reason, dynamical diffraction of X-rays and neutrons constitutes the theoretical basis of a great variety of applications such as: • the techniques used for the characterization of nearly perfect high technology materials, semiconductors, piezoelectric, electrooptic, ferroelectric, magnetic crystals, • the X-ray optical devices used in all modem applications of Synchrotron Radiation (EXAFS, High Resolution X-ray Diffractometry, magnetic and nuclear resonant scattering, topography, etc. ), and • X-ray and neutron interferometry.
Endlich ein Fachbuch mit detaillierten Informationen zu einer der fortschrittlichsten Methoden zur Materialcharakterisierung. Ein herausragendes Team aus Herausgebern und Autoren von renommierten Einrichtungen und Institutionen beschäftigt sich mit Synchrotron-Verfahren, die sich in der Materialforschung bewährt haben. Nach einer Einführung in die Synchrotronstrahlung und ihrer Quellen werden die verschiedenen Techniken beschrieben, die von diesem besonders hellen Licht profitieren, u. a. Röntgenabsorption, Diffraktion, Streuung, Bildgebung und Lithographie. Zum Schluss folgt ein Überblick über die Anwendungen der Synchrotronstrahlung in den Materialwissenschaften. Dieses einzigartige, unabdingbare Referenzwerk für akademische Forscher und Forscher aus der Industrie verbindet Spezialisten aus der Synchrotronforschung und Materialwissenschaftler.
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
