Reviews and presents current research for investigators, users and potential users of thermal plasma technology. A broad range of applications are discussed, including melting and refining, extractive metallurgy, plasma spraying, composite materials processing, and plasma synthesis of materials.
Intense recent activity in the field of high-temperature superconductivity both in Japan and in the rest of the world was discussed at the First International Symposium on Superconductivity held in Nagoya in August 1988. Current research and development efforts by major Japanese companies in the field of high-temperature superconductivity are reported by leading company scientists, to give an overview of the high level of activity in the area. Progress in the development of new materials and recent theoretical work is reported both from Japanese and international researchers. Contributions are organized by topic, with such topics as crystal chemistry and electronic structure, processing and microstructure, tapes and thick films, wires and coils, and thin film processing and properties. Future applications of superconductivity including magnetic levitation vehicles, electronics based on Josephson junctions, power delivery, energy storage, ship propulsion and magnetic resonance imaging are particularly stressed.
This is the second of three volumes of the extensively revised and updated second edition of the Handbook of Superconductivity. The past twenty years have seen rapid progress in superconducting materials, which exhibit one of the most remarkable physical states of matter ever to be discovered. Superconductivity brings quantum mechanics to the scale of the everyday world where a single, coherent quantum state may extend over a distance of metres, or even kilometres, depending on the size of a coil or length of superconducting wire. Viable applications of superconductors rely fundamentally on an understanding of this intriguing phenomena and the availability of a range of materials with bespoke properties to meet practical needs. While the first volume covers the fundamentals of superconductivity and the various classes of superconducting materials, Volume 2 covers processing of the desired superconducting materials into desired forms: bulks, films, wires and junction-based devices. The volume closes with articles on the refrigeration methods needed to put the materials into the superconducting state. Key Features: Covers the depth and breadth of the field Includes contributions from leading academics and industry professionals across the world Provides hands-on guidance to the manufacturing and processing technologies A comprehensive reference, the handbook is suitable for both graduate students and practitioners in experimental physics, materials science, and multiple engineering disciplines, including electronic and electrical, chemical, mechanical, metallurgy and others.
A wide range of progress in materials development [single crystals, ceramics, thin films, wire and tapes] is reported in the 169 papers in this volume. The main focus of the papers is in attaining a better understanding of the relationship between microstructure and electrical properties. Invited papers cover topics such as the effects of substitution and doping; multilayers; nanostructure characterisation; electric field effects in High Tc Superconductors [HTS]; surface stability; critical currents; flux pinning and magnetooptic imaging of flux patterns; effects of irradiation induced defects; properties and preparation of materials; microwave properties and electronic devices. A clearly broadened basis for understanding processes and mechanisms in [HTS] is portrayed. Appreciable progress has been achieved in the reproducible manufacturing of high quality materials supported by very efficient methods in microstructural analysis. This essential improvement is reflected in the increased number of practical devices encouraging the use of HTS in applications for electronics and power engineering, all of which are reviewed in depth in this work.
This conference is the second on the Science and Technology of Thin Film Superconductors. It proved to be an excellent forum for these specialists in thin film superconductivity. The conference, held April 30-May 4, 1990, in Denver, Colorado, hosted 170 researchers from 17 countries. The response to the conference again emphasized the need for a meeting devoted to the science and technology of thin film superconductors. The breadth of artic1es and advances made in this technology since the first conference in November 1988, reflect on the maturity of the topic. These proceedings contain artic1es on deposition methods by sputtering, e1ectron beam evaporation, resistive evaporation, laser ablation, chemical vapor deposition and electrodeposition, and on other studies related to substrates, thermodynamics of formation, grain boundaries and weak links, characterization, and some practical applications. The program committee was pleased with the quality of the publications and contributed articles. This conference was highlighted by a fuU day dedicated to presentations from the federallaboratories, discussing a wide range of topics on the fabrication, characterization, and theory of high-temperature superconductor thin films. Other highlights at the conference dealt with (1) critical parameters or problems in measuring critical current density and other important parameters, and (2) problems of scale-up, reproducibility, and amenability to device fabrication. It became evident from the presentations that three issues were developing into critical issues for the ultimate practical application of high temperature superconductor thin films.
The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.