Reflection High-Energy Electron Diffraction
Author: Ayahiko Ichimiya
Publisher: Cambridge University Press
Published: 2004-12-13
Total Pages: 370
ISBN-13: 9780521453738
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Author: Ayahiko Ichimiya
Publisher: Cambridge University Press
Published: 2004-12-13
Total Pages: 370
ISBN-13: 9780521453738
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Author: Wolfgang Braun
Publisher: Springer Science & Business Media
Published: 1999-04-16
Total Pages: 240
ISBN-13: 9783540651994
DOWNLOAD EBOOKThe book describes RHEED (reflection high-energy electron diffraction) used as a tool for crystal growth. New methods using RHEED to characterize surfaces and interfaces during crystal growth by MBE (molecular beam epitaxy) are presented. Special emphasis is put on RHEED intensity oscillations, segregation phenomena, electron energy-loss spectroscopy and RHEED with rotating substrates.
Author: N. Masud
Publisher:
Published: 1976
Total Pages: 192
ISBN-13:
DOWNLOAD EBOOKAuthor: P.K. Larsen
Publisher: Springer Science & Business Media
Published: 2012-12-06
Total Pages: 526
ISBN-13: 146845580X
DOWNLOAD EBOOKThis volume contains the papers presented at the NATO Advanced Research Workshop in "Reflection High Energy Electron Diffraction and Reflection Electron Imaging of Surfaces" held at the Koningshof conference center, Veldhoven, the Netherlands, June 15-19, 1987. The main topics of the workshop, Reflection High Energy Electron Diffraction (RHEED) and Reflection Electron Microscopy (REM), have a common basis in the diffraction processes which high energy electrons undergo when they interact with solid surfaces at grazing angles. However, while REM is a new technique developed on the basis of recent advances in transmission electron microscopy, RHEED is an old method in surface crystallography going back to the discovery of electron diffraction in 1927 by Davisson and Germer. Until the development of ultra high vacuum techniques in the 1960's made instruments using slow electrons more accessable, RHEED was the dominating electron diffraction technique. Since then and until recently the method of Low Energy Electron Diffraction (LEED) largely surpassed RHEED in popularity in surface studies. The two methods are closely related of course, each with its own specific advantages. The grazing angle geometry of RHEED has now become a very useful feature because this makes it ideally suited for combination with the thin growth technique of Molecular Beam Epitaxy (MBE). This combination allows in-situ studies of freshly grown and even growing surfaces, opening up new areas of research of both fundamental and technological importance.
Author: L. M. Peng
Publisher: Oxford University Press
Published: 2004-01-08
Total Pages: 558
ISBN-13: 0191004782
DOWNLOAD EBOOKThis book provides a comprehensive introduction to high energy electron diffraction and elastic and inelastic scattering of high energy electrons, with particular emphasis on applications to modern electron microscopy. Starting from a survey of fundamental phenomena, the authors introduce the most important concepts underlying modern understanding of high energy electron diffraction. Dynamical diffraction in transmission (THEED) and reflection (RHEED) geometries is treated using a general matrix theory, where computer programs and worked examples are provided to illustrate the concepts and to familiarize the reader with practical applications. Diffuse and inelastic scattering and coherence effects are treated comprehensively both as a perturbation of elastic scattering and within the general multiple scattering quantum mechanical framework of the density matrix method. Among the highlights are the treatment of resonance diffraction of electrons, HOLZ diffraction, the formation of Kikuchi bands and lines and ring patterns, and application of diffraction to monitoring of growing surfaces. Useful practical data are summarised in tables including those of electron scattering factors for all the neutral atoms and many ions, and the temperature dependent Debye-Waller factors given for over 100 elemental crystals and compounds.
Author: Zhong Lin Wang
Publisher: Cambridge University Press
Published: 1996-05-23
Total Pages: 457
ISBN-13: 0521482666
DOWNLOAD EBOOKA self-contained book on electron microscopy and spectrometry techniques for surface studies.
Author: Jan Paul Antoni Van der Wagt
Publisher:
Published: 1994
Total Pages: 326
ISBN-13:
DOWNLOAD EBOOKAuthor: The Surface Science Society of Japan
Publisher: Springer
Published: 2018-02-19
Total Pages: 807
ISBN-13: 9811061564
DOWNLOAD EBOOKThis book concisely illustrates the techniques of major surface analysis and their applications to a few key examples. Surfaces play crucial roles in various interfacial processes, and their electronic/geometric structures rule the physical/chemical properties. In the last several decades, various techniques for surface analysis have been developed in conjunction with advances in optics, electronics, and quantum beams. This book provides a useful resource for a wide range of scientists and engineers from students to professionals in understanding the main points of each technique, such as principles, capabilities and requirements, at a glance. It is a contemporary encyclopedia for selecting the appropriate method depending on the reader's purpose.
Author: Zhong-lin Wang
Publisher: Springer Science & Business Media
Published: 2013-06-29
Total Pages: 461
ISBN-13: 1489915796
DOWNLOAD EBOOKElastic and inelastic scattering in transmission electron microscopy (TEM) are important research subjects. For a long time, I have wished to systematically summarize various dynamic theories associated with quantitative electron micros copy and their applications in simulations of electron diffraction patterns and images. This wish now becomes reality. The aim of this book is to explore the physics in electron diffraction and imaging and related applications for materials characterizations. Particular emphasis is placed on diffraction and imaging of inelastically scattered electrons, which, I believe, have not been discussed exten sively in existing books. This book assumes that readers have some preknowledge of electron microscopy, electron diffraction, and quantum mechanics. I anticipate that this book will be a guide to approaching phenomena observed in electron microscopy from the prospects of diffraction physics. The SI units are employed throughout the book except for angstrom (A), which is used occasionally for convenience. To reduce the number of symbols used, the Fourier transform of a real-space function P'(r), for example, is denoted by the same symbol P'(u) in reciprocal space except that r is replaced by u. Upper and lower limits of an integral in the book are (-co, co) unless otherwise specified. The (-co, co) integral limits are usually omitted in a mathematical expression for simplification. I very much appreciate opportunity of working with Drs. J. M. Cowley and J. C. H. Spence (Arizona State University), J.
Author: Gertjan Koster
Publisher: Elsevier
Published: 2011-10-05
Total Pages: 295
ISBN-13: 0857094955
DOWNLOAD EBOOKAdvanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques