Theoretical Studies of Chemisorption and Surface Reactions on Nickel and Silicon

Theoretical Studies of Chemisorption and Surface Reactions on Nickel and Silicon

Author:

Publisher:

Published: 1990

Total Pages: 8

ISBN-13:

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The research is part of a theoretical program on the structure of molecules adsorbed on solid surfaces and dissociative chemisorption which emphasis on transition metal substrates and electronic materials. An embedding theory for treating chemisorption on metals is further developed and applied to the reaction of hydrocarbon fragments and hydrogen coadsorbed on nickel, the dissociation of water on nickel, and the system H/Ni, NH3/Ni, and C6H6/Ni. The main emphasis of the work is on the energetics of adsorption as a function of surface site, the potential energy for adsorbate motion between surface sites and the energetics of surface reactions. Equilibrium geometries, vibrational frequencies and ionization potentials are also calculated. Preliminary work on the description of Si(100) surfaces has been completed in preparation of H/Si and N/Si adsorption studies. Studies of [pi] bonding on Si(111) were also completed and work was begun on the Auger ionization of F/Si. The original form of the embedding theory has been extended to make use of an effective potential representation of the bulk electrons interacting with the embedded surface region. Effective core potentials for Fe have been developed.


Chemisorption And Reactions On Metallic Films V1

Chemisorption And Reactions On Metallic Films V1

Author: J Anderson

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 568

ISBN-13: 0323145698

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Chemisorption and Reactions on Metallic Films, Volume 1 is a six-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry. Chapter 1 presents electron microscopy and diffraction studies and their contributions in elucidating the growth and structure of polycrystalline and epitaxially grown films. Chapter 2 describes the techniques of preparation and characterization of metallic films and examines the heats of adsorption, electrical conductivity, surface area, and sticking probabilities of such films. Chapter 3 discusses the strength of pairwise interactions; the influence of the intermetallic bond on the equilibrium shape of metal crystallites; the bonding of individual metal atoms to different crystallographic planes; the interaction of metal atoms and crystallites with non-conducting substrates; and the effects of residual gases on this interaction. Chapters 4 and 5 address the adsorption of metallic films, with an emphasis on general trends in adsorptive and electronic properties of bulk metals. These chapters also discuss the effects of adsorption on the electrical conductance of island-like and coherent films and on the ferromagnetic properties of films. Chapter 6 evaluates the application of infrared spectroscopy to the studies of the surfaces of metal films and the use of the available infrared spectroscopic data in reconciling the results of adsorption studies on oxide-supported metal particles with those obtained with clean evaporated metal films prepared under ultra high vacuum conditions. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.