Soft X-Rays and Extreme Ultraviolet Radiation
Soft X-Rays and Extreme Ultraviolet Radiation

Author: David Attwood

Publisher: Cambridge University Press

Published: 2007-02-22

Total Pages: 611

ISBN-13: 1139643428

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This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

Principles of Lithography
Principles of Lithography

Author: Harry J. Levinson

Publisher: SPIE Press

Published: 2005

Total Pages: 446

ISBN-13: 9780819456601

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Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

X-Rays and Extreme Ultraviolet Radiation
X-Rays and Extreme Ultraviolet Radiation

Author: David Attwood

Publisher: Cambridge University Press

Published: 2016

Total Pages: 655

ISBN-13: 1107062896

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Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.

Spectroscopy for Materials Characterization
Spectroscopy for Materials Characterization

Author: Simonpietro Agnello

Publisher: John Wiley & Sons

Published: 2021-09-08

Total Pages: 500

ISBN-13: 1119697328

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SPECTROSCOPY FOR MATERIALS CHARACTERIZATION Learn foundational and advanced spectroscopy techniques from leading researchers in physics, chemistry, surface science, and nanoscience In Spectroscopy for Materials Characterization, accomplished researcher Simonpietro Agnello delivers a practical and accessible compilation of various spectroscopy techniques taught and used to today. The book offers a wide-ranging approach taught by leading researchers working in physics, chemistry, surface science, and nanoscience. It is ideal for both new students and advanced researchers studying and working with spectroscopy. Topics such as confocal and two photon spectroscopy, as well as infrared absorption and Raman and micro-Raman spectroscopy, are discussed, as are thermally stimulated luminescence and spectroscopic studies of radiation effects on optical materials. Each chapter includes a basic introduction to the theory necessary to understand a specific technique, details about the characteristic instrumental features and apparatuses used, including tips for the appropriate arrangement of a typical experiment, and a reproducible case study that shows the discussed techniques used in a real laboratory. Readers will benefit from the inclusion of: Complete and practical case studies at the conclusion of each chapter to highlight the concepts and techniques discussed in the material Citations of additional resources ideal for further study A thorough introduction to the basic aspects of radiation matter interaction in the visible-ultraviolet range and the fundamentals of absorption and emission A rigorous exploration of time resolved spectroscopy at the nanosecond and femtosecond intervals Perfect for Master and Ph.D. students and researchers in physics, chemistry, engineering, and biology, Spectroscopy for Materials Characterization will also earn a place in the libraries of materials science researchers and students seeking a one-stop reference to basic and advanced spectroscopy techniques.

Handbook of Nanosafety
Handbook of Nanosafety

Author: Ulla Vogel

Publisher: Elsevier

Published: 2013-12-17

Total Pages: 377

ISBN-13: 0124166628

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Handbook of Nanosafety: Measurement, Exposure and Toxicology, written by leading international experts in nanosafety, provides a comprehensive understanding of engineered nanomaterials (ENM), current international nanosafety regulation, and how ENM can be safely handled in the workplace. Increasingly, the importance of safety needs to be considered when promoting the use of novel technologies like ENM. With its use of case studies and exposure scenarios, Handbook of Nanosafety demonstrates techniques to assess exposure and risks and how these assessments can be applied to improve workers' safety. Topics covered include the effects of ENM on human health, characterization of ENM, aerosol dynamics and measurement, exposure and risk assessment, and safe handling of ENM. Based on outcomes from the NANODEVICE initiative, this is an essential resource for those who need to apply current nanotoxicological thinking in the workplace and anyone who advises on nanosafety, such as professionals in toxicology, occupational safety and risk assessment. - Multi-authored book, written by leading researchers in the field of nanotoxicology and nanosafety - Features state-of-the-art physical and chemical characterization of engineered nanomaterials (ENM) - Develops strategies for exposure assessment, risk assessment and risk management - Includes practical case studies and exposure scenarios to demonstrate how you can safely use ENM in the workplace

Extreme Nonlinear Optics
Extreme Nonlinear Optics

Author: Martin Wegener

Publisher: Springer Science & Business Media

Published: 2006-03-30

Total Pages: 225

ISBN-13: 3540266887

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Following the birth of the laser in 1960, the field of "nonlinear optics" rapidly emerged. Today, laser intensities and pulse durations are readily available, for which the concepts and approximations of traditional nonlinear optics no longer apply. In this regime of "extreme nonlinear optics," a large variety of novel and unusual effects arise, for example frequency doubling in inversion symmetric materials or high-harmonic generation in gases, which can lead to attosecond electromagnetic pulses or pulse trains. Other examples of "extreme nonlinear optics" cover diverse areas such as solid-state physics, atomic physics, relativistic free electrons in a vacuum and even the vacuum itself. This book starts with an introduction to the field based primarily on extensions of two famous textbook examples, namely the Lorentz oscillator model and the Drude model. Here the level of sophistication should be accessible to any undergraduate physics student. Many graphical illustrations and examples are given. The following chapters gradually guide the student towards the current "state of the art" and provide a comprehensive overview of the field. Every chapter is accompanied by exercises to deepen the reader's understanding of important topics, with detailed solutions at the end of the book.

Vortex Dynamics and Optical Vortices
Vortex Dynamics and Optical Vortices

Author: Hector Perez-De-Tejada

Publisher: BoD – Books on Demand

Published: 2017-03-01

Total Pages: 346

ISBN-13: 9535129295

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The contents of the book cover a wide variety of topics related to the analysis of the dynamics of vortices and describe the results of experiments, computational modeling and their interpretation. The book contains 13 chapters reaching areas of physics in vortex dynamics and optical vortices including vortices in superfluid atomic gases, vortex laser beams, vortex-antivortex in ferromagnetic hybrids, and optical vortices illumination in chiral nanostructures. Also, discussions are presented on particle motion in vortex flows, on the simulation of vortex-dominated flows, on vortices in saturable media, on achromatic vortices, and on ultraviolet vortices. Fractal light vortices, coherent vortex beams, together with vortices in electric dipole radiation, and spin wave dynamics in magnetic vortices are examined as well.