Advanced Nano Deposition Methods

Advanced Nano Deposition Methods

Author: Yuan Lin

Publisher: John Wiley & Sons

Published: 2016-08-29

Total Pages: 328

ISBN-13: 3527696458

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This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.


Physics of Manganites

Physics of Manganites

Author: T.A. Kaplan

Publisher: Springer Science & Business Media

Published: 1999-05-31

Total Pages: 299

ISBN-13: 0306461323

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This series of books, which is published at the rate of about one per year, addresses fundamental problems in materials science. The contents cover a broad range of topics from small clusters of atoms to engineering materials and involves chemistry, physics, materials science and engineering, with length scales ranging from Ångstroms up to millimeters. The emphasis is on basic science rather than on applications. Each book focuses on a single area of current interest and brings together leading experts to give an up to date discussion of their work and the work of others. Each article contains enough references that the interested reader can access the relevant literature. Thanks are given to the Center for Fundamental Materials Research at Michigan State University for supporting this series. M. F. Thorpe, Series Editor E mail: thorpe@pa. msu. edu V PREFACE This book records invited lectures given at the workshop on Physics of Manganites, held at Michigan State University, July 26 29, 1998. Doped manganites are an interesting class of compounds that show both metal insulator and ferromagnetic to paramagnetic transitions at the same temperature. This was discovered in the early 1950s by Jonker and van Santen and basic theoretical ideas were developed by Zener (1951), Anderson and Hasegawa (1955), and deGennes (1960) to explain these transitions and related interesting observations.


Oxide Electronics

Oxide Electronics

Author: Asim K. Ray

Publisher: John Wiley & Sons

Published: 2021-04-12

Total Pages: 628

ISBN-13: 1119529476

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Oxide Electronics Multiple disciplines converge in this insightful exploration of complex metal oxides and their functions and properties Oxide Electronics delivers a broad and comprehensive exploration of complex metal oxides designed to meet the multidisciplinary needs of electrical and electronic engineers, physicists, and material scientists. The distinguished author eschews complex mathematics whenever possible and focuses on the physical and functional properties of metal oxides in each chapter. Each of the sixteen chapters featured within the book begins with an abstract and an introduction to the topic, clear explanations are presented with graphical illustrations and relevant equations throughout the book. Numerous supporting references are included, and each chapter is self-contained, making them perfect for use both as a reference and as study material. Readers will learn how and why the field of oxide electronics is a key area of research and exploitation in materials science, electrical engineering, and semiconductor physics. The book encompasses every application area where the functional and electronic properties of various genres of oxides are exploited. Readers will also learn from topics like: Thorough discussions of High-k gate oxide for silicon heterostructure MOSFET devices and semiconductor-dielectric interfaces An exploration of printable high-mobility transparent amorphous oxide semiconductors Treatments of graphene oxide electronics, magnetic oxides, ferroelectric oxides, and materials for spin electronics Examinations of the calcium aluminate binary compound, perovoksites for photovoltaics, and oxide 2Degs Analyses of various applications for oxide electronics, including data storage, microprocessors, biomedical devices, LCDs, photovoltaic cells, TFTs, and sensors Suitable for researchers in semiconductor technology or working in materials science, electrical engineering, and physics, Oxide Electronics will also earn a place in the libraries of private industry researchers like device engineers working on electronic applications of oxide electronics. Engineers working on photovoltaics, sensors, or consumer electronics will also benefit from this book.


Intermediate-Temperature Solid Oxide Fuel Cells

Intermediate-Temperature Solid Oxide Fuel Cells

Author: Zongping Shao

Publisher: Springer

Published: 2016-09-12

Total Pages: 271

ISBN-13: 366252936X

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This book discusses recent advances in intermediate-temperature solid oxide fuel cells (IT-SOFCs), focusing on material development and design, mechanism study, reaction kinetics and practical applications. It consists of five chapters presenting different types of reactions and materials employed in electrolytes, cathodes, anodes, interconnects and sealants for IT-SOFCs. It also includes two chapters highlighting new aspects of these solid oxide fuel cells and exploring their practical applications. This insightful and useful book appeals to a wide readership in various fields, including solid oxide fuel cells, electrochemistry, membranes and ceramics. Zongping Shao is a Professor at the State Key Laboratory of Materials-Oriented Chemical Engineering and the College of Energy, Nanjing University of Technology, China. Moses O. Tade is a Professor at the Department of Chemical Engineering, Curtin University, Australia.


Thin Films on Silicon

Thin Films on Silicon

Author: Vijay Narayanan

Publisher:

Published: 2016

Total Pages: 550

ISBN-13: 9789814740487

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"This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted."--Publisher's website.


Thin Film Analysis by X-Ray Scattering

Thin Film Analysis by X-Ray Scattering

Author: Mario Birkholz

Publisher: John Wiley & Sons

Published: 2006-05-12

Total Pages: 378

ISBN-13: 3527607048

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With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.


Hard X-ray Photoelectron Spectroscopy (HAXPES)

Hard X-ray Photoelectron Spectroscopy (HAXPES)

Author: Joseph Woicik

Publisher: Springer

Published: 2015-12-26

Total Pages: 576

ISBN-13: 3319240439

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This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.


Thin Film Metal-Oxides

Thin Film Metal-Oxides

Author: Shriram Ramanathan

Publisher: Springer Science & Business Media

Published: 2009-12-03

Total Pages: 344

ISBN-13: 1441906649

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Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.


Spectroscopy of Complex Oxide Interfaces

Spectroscopy of Complex Oxide Interfaces

Author: Claudia Cancellieri

Publisher: Springer

Published: 2018-04-09

Total Pages: 326

ISBN-13: 3319749897

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This book summarizes the most recent and compelling experimental results for complex oxide interfaces. The results of this book were obtained with the cutting-edge photoemission technique at highest energy resolution. Due to their fascinating properties for new-generation electronic devices and the challenge of investigating buried regions, the book chiefly focuses on complex oxide interfaces. The crucial feature of exploring buried interfaces is the use of soft X-ray angle-resolved photoemission spectroscopy (ARPES) operating on the energy range of a few hundred eV to increase the photoelectron mean free path, enabling the photons to penetrate through the top layers – in contrast to conventional ultraviolet (UV)-ARPES techniques. The results presented here, achieved by different research groups around the world, are summarized in a clearly structured way and discussed in comparison with other photoemission spectroscopy techniques and other oxide materials. They are complemented and supported by the most recent theoretical calculations as well as results of complementary experimental techniques including electron transport and inelastic resonant X-ray scattering.