SPIE ... Publications Index
Author:
Publisher:
Published: 1992
Total Pages: 720
ISBN-13:
DOWNLOAD EBOOKRead and Download eBook Full
Author:
Publisher:
Published: 1992
Total Pages: 720
ISBN-13:
DOWNLOAD EBOOKAuthor: Franklin S. Harris
Publisher: Society of Photo Optical
Published: 1991-01-01
Total Pages: 634
ISBN-13: 9780819406453
DOWNLOAD EBOOKAuthor:
Publisher:
Published: 1992
Total Pages: 762
ISBN-13:
DOWNLOAD EBOOKAuthor: S P I E-International Society for Optical Engineering
Publisher: SPIE-International Society for Optical Engineering
Published: 1991-12
Total Pages: 634
ISBN-13: 9780819406453
DOWNLOAD EBOOKAuthor: SPIE (Society of Photo-optical Instrumentation Engineers) the International Society for Optical Engineering
Publisher:
Published: 1993
Total Pages: 0
ISBN-13: 9780819413413
DOWNLOAD EBOOKAuthor: John Lester Miller
Publisher: McGraw Hill Professional
Published: 2002-12-11
Total Pages: 450
ISBN-13: 0071500901
DOWNLOAD EBOOKThis engineering tool provides over 200 time and cost saving rules of thumb--short cuts, tricks, and methods that optical communications veterans have developed through long years of trial and error. * DWDM (Dense Wavelength Division Multiplexing) and SONET (Synchronous Optical NETwork) rules * Information Transmission, fiber optics, and systems rules
Author:
Publisher:
Published: 1992
Total Pages: 780
ISBN-13:
DOWNLOAD EBOOKAuthor: Franklin S. Jr. (indexer) Harris
Publisher:
Published: 1991
Total Pages: 634
ISBN-13: 9780819406453
DOWNLOAD EBOOKAuthor: Larry C. Andrews
Publisher: Society of Photo Optical
Published: 2004
Total Pages: 96
ISBN-13: 9780819453181
DOWNLOAD EBOOKThe material in this Field Guide is a condensed version of similar material found in two textbooks: Laser Beam Propagation through Random Media (SPIE Vol. PM53) and Laser Beam Scintillation with Applications (SPIE Vol. PM99). Topics chosen for this concise presentation include a review of classical Kolmogorov turbulence theory, Gaussian-beam waves in free space, and atmospheric effects on a propagating optical wave. These atmospheric effects have great importance in a variety of applications like imaging, free space optical communications, laser radar, and remote sensing. This Guide presents tractable mathematical models from which the practitioner can readily determine beam spreading, beam wander, spatial coherence radius (Fried's parameter), angle of arrival fluctuations, scintillation, aperture averaging effects, fade probabilities, bit error-rates, and enhanced backscatter effects, among others.
Author: Vivek Bakshi
Publisher: SPIE Press
Published: 2009
Total Pages: 704
ISBN-13: 0819469645
DOWNLOAD EBOOKEditorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.