Over the last fifty-plus years, the increased complexity and speed of integrated circuits have radically changed our world. Today, semiconductor manufacturing is perhaps the most important segment of the global manufacturing sector. As the semiconductor industry has become more competitive, improving planning and control has become a key factor for business success. This book is devoted to production planning and control problems in semiconductor wafer fabrication facilities. It is the first book that takes a comprehensive look at the role of modeling, analysis, and related information systems for such manufacturing systems. The book provides an operations research- and computer science-based introduction into this important field of semiconductor manufacturing-related research.
This book concentrates on real-world production scheduling in factories and industrial settings. It includes industry case studies that use innovative techniques as well as academic research results that can be used to improve production scheduling. Its purpose is to present scheduling principles, advanced tools, and examples of innovative scheduling systems to persons who could use this information to improve their own production scheduling.
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Given the myriad exhaust compounds and the corresponding problems that they can pose in an exhaust management system, the proper choice of such systems is a complex task. Presenting the fundamentals, technical details, and general solutions to real-world problems, Semiconductor Industry: Wafer Fab Exhaust Management offers practical guidance on selecting an appropriate system for a given application. Using examples that provide a clear understanding of the concepts discussed, Sherer covers facility layout, support facilities operations, and semiconductor process equipment, followed by exhaust types and challenges. He reviews exhaust point-of-use devices and exhaust line requirements needed between process equipment and the centralized exhaust system. The book includes information on wet scrubbers for a centralized acid exhaust system and a centralized ammonia exhaust system and on centralized equipment to control volatile organic compounds. It concludes with a chapter devoted to emergency releases and a separate chapter of examples illustrating these systems in use. Drawing on the author's 20 years of industry experience, the book shows you how to customize strategies specific to your needs, solve current problems, and prevent future issues in your exhaust management systems.
At the crossroads of artificial intelligence, manufacturing engineering, operational research and industrial engineering and management, multi-agent based production planning and control is an intelligent and industrially crucial technology with increasing importance. This book provides a complete overview of multi-agent based methods for today’s competitive manufacturing environment, including the Job Shop Manufacturing and Re-entrant Manufacturing processes. In addition to the basic control and scheduling systems, the author also highlights advance research in numerical optimization methods and wireless sensor networks and their impact on intelligent production planning and control system operation. Enables students, researchers and engineers to understand the fundamentals and theories of multi-agent based production planning and control Written by an author with more than 20 years’ experience in studying and formulating a complete theoretical system in production planning technologies Fully illustrated throughout, the methods for production planning, scheduling and controlling are presented using experiments, numerical simulations and theoretical analysis Comprehensive and concise, Multi-Agent Based Production Planning and Control is aimed at the practicing engineer and graduate student in industrial engineering, operational research, and mechanical engineering. It is also a handy guide for advanced students in artificial intelligence and computer engineering.
This book presents a comprehensive overview of recent developments in production planning. The monograph begins with an introductory chapter reviewing the need for these production planning models, that operate by determining time-phased releases of work into the facility or supply chain, relating these to the Manufacturing Planning and Control (MPC) and Advanced Planning and Scheduling (APS) frameworks, that form the basis of most academic research and industrial practice. The extensive body of work on Workload Control is also placed in this context, and proves the need for improved models with a discussion of the difficulties, these approaches encounter. The next two chapters present a detailed review of the state of the art in optimization models based on exogenous planned lead times, and examines the cases where these can take both integer and fractional values. The difficulties arising in estimating planned lead times are consistent with factory behavior which are highlighted, noting that many of these lead to non-convex optimization models. Attempts to address these difficulties by iterative multimodel approaches, that combine simulation and mathematical programming, are also discussed in detail. The next three chapters of the volume address the set of techniques developed using clearing functions, which represent the expected output of a resource in a planning period, as a function of the expected workload of the resource, during that period. The chapters on this subject propose a basic optimization model for multiple products, discuss the difficulties of this model and some possible solutions. It also reviews prior work, and discuss a number of alternative formulations of the clearing function concept with their respective advantages and disadvantages. Applications to lot sizing decisions and a number of other specific problems are also described. This volume concludes with an assessment of the state of the art described in the volume, and several directions for future work.
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
This open access book reports on cutting-edge electrical engineering and microelectronics solutions to foster and support digitalization in the semiconductor industry. Based on the outcomes of the European project iDev40, which were presented at the two first conference editions of the European Advances in Digital Transformation Conference (EADCT 2018 and EADTC 2019), the book covers different, multidisciplinary aspects related to digital transformation, including technological and industrial developments, as well as human factors research and applications. Topics include modeling and simulation methods in semiconductor operations, supply chain management issues, employee training methods and workplaces optimization, as well as smart software and hardware solutions for semiconductor manufacturing. By highlighting industrially relevant developments and discussing open issues related to digital transformation, the book offers a timely, practice-oriented guide to graduate students, researchers and professionals interested in the digital transformation of manufacturing domains and work environments.
This significant and uniquely comprehensive five-volume reference is a valuable source for research workers, practitioners, computer scientists, students, and technologists. It covers all of the major topics within the subject and offers a comprehensive treatment of MEMS design, fabrication techniques, and manufacturing methods. It also includes current medical applications of MEMS technology and provides applications of MEMS to opto-electronic devices. It is clearly written, self-contained, and accessible, with helpful standard features including an introduction, summary, extensive figures and design examples with comprehensive reference lists.
