Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Author: Jerzy Rużyłło
Publisher: The Electrochemical Society
Published: 1998
Total Pages: 668
ISBN-13: 9781566771887
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Author: Jerzy Rużyłło
Publisher: The Electrochemical Society
Published: 1998
Total Pages: 668
ISBN-13: 9781566771887
DOWNLOAD EBOOKAuthor: Takao Abe
Publisher: The Electrochemical Society
Published: 1999
Total Pages: 548
ISBN-13: 9781566772235
DOWNLOAD EBOOKAuthor: Richard E. Novak
Publisher: The Electrochemical Society
Published: 1996
Total Pages: 642
ISBN-13: 9781566771153
DOWNLOAD EBOOKAuthor: Jerzy Rużyłło
Publisher: The Electrochemical Society
Published: 2004
Total Pages: 452
ISBN-13: 9781566774116
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Published: 2003
Total Pages: 458
ISBN-13:
DOWNLOAD EBOOKAuthor: Dennis N. Schmidt
Publisher: The Electrochemical Society
Published: 1994
Total Pages: 454
ISBN-13: 9781566770415
DOWNLOAD EBOOKAuthor: Karen Reinhardt
Publisher: William Andrew
Published: 2018-03-16
Total Pages: 794
ISBN-13: 032351085X
DOWNLOAD EBOOKHandbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. - Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits - Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Author: Robert P. Donovan
Publisher: CRC Press
Published: 2018-10-08
Total Pages: 460
ISBN-13: 1482289997
DOWNLOAD EBOOKRecognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.
Author: Badih El-Kareh
Publisher: Springer Science & Business Media
Published: 1994-12-31
Total Pages: 620
ISBN-13: 9780792395348
DOWNLOAD EBOOKThe drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Author: Howard R. Huff
Publisher: The Electrochemical Society
Published: 1994
Total Pages: 1284
ISBN-13: 9781566770422
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