Organometallic Vapor-Phase Epitaxy
Organometallic Vapor-Phase Epitaxy

Author: Gerald B. Stringfellow

Publisher: Elsevier

Published: 1999-03-04

Total Pages: 599

ISBN-13: 0080538185

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Organometallic Vapor-Phase Epitaxy describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices. - Updated with new emphasis on the semiconducting nitride materials—GaN and its alloys with In and Al - Emphasizes the newly understood aspects of surface processes - Contains a new chapter, as well as several new sections in chapters on thermodynamics and kinetics

Semiconductor Materials for Optoelectronics and LTMBE Materials
Semiconductor Materials for Optoelectronics and LTMBE Materials

Author: J.P. Hirtz

Publisher: Elsevier

Published: 2016-07-29

Total Pages: 365

ISBN-13: 1483290425

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These three day symposia were designed to provide a link between specialists from university or industry who work in different fields of semiconductor optoelectronics. Symposium A dealt with topics including: epitaxial growth of III-V, II-VI, IV-VI, Si-based structures; selective-area, localized and non-planar epitaxy, shadow-mask epitaxy; bulk and new optoelectronic materials; polymers for optoelectronics. Symposium B dealt with III-V epitaxial layers grown by low temperature molecular beam epitaxy, a subject which has undergone rapid development in the last three years.

Crystal Growth Technology
Crystal Growth Technology

Author: Hans J. Scheel

Publisher: John Wiley & Sons

Published: 2005-12-13

Total Pages: 694

ISBN-13: 0470871679

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This volume deals with the technologies of crystal fabrication, of crystal machining, and of epilayer production and is the first book on industrial and scientific aspects of crystal and layer production. The major industrial crystals are treated: Si, GaAs, GaP, InP, CdTe, sapphire, oxide and halide scintillator crystals, crystals for optical, piezoelectric and microwave applications and more. Contains 29 contributions from leading crystal technologists covering the following topics: * General aspects of crystal growth technology * Silicon * Compound semiconductors * Oxides and halides * Crystal machining * Epitaxy and layer deposition Scientific and technological problems of production and machining of industrial crystals are discussed by top experts, most of them from the major growth industries and crystal growth centers. In addition, it will be useful for the users of crystals, for teachers and graduate students in materials sciences, in electronic and other functional materials, chemical and metallurgical engineering, micro-and optoelectronics including nanotechnology, mechanical engineering and precision-machining, microtechnology, and in solid-state sciences.

Bibliographic Guide to Conference Publications
Bibliographic Guide to Conference Publications

Author: New York Public Library. Research Libraries

Publisher:

Published: 1986

Total Pages: 618

ISBN-13:

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Vols. for 1975- include publications cataloged by the Research Libraries of the New York Public Library with additional entries from the Library of Congress MARC tapes.