Handbook of VLSI Microlithography, 2nd Edition
Handbook of VLSI Microlithography, 2nd Edition

Author: John N. Helbert

Publisher: Cambridge University Press

Published: 2001-04

Total Pages: 1026

ISBN-13: 0080946801

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This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Handbook of VLSI Microlithography
Handbook of VLSI Microlithography

Author: John N. Helbert

Publisher: William Andrew

Published: 2001-04-01

Total Pages: 1025

ISBN-13: 0815517807

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This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Nonlinear Electrodynamics in Biological Systems
Nonlinear Electrodynamics in Biological Systems

Author: W. Adey

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 589

ISBN-13: 146132789X

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The past half century has seen an extraordinary growth in the fields of cellular and molecular biology. From simple morphologi cal concepts of cells as the essential units of living matter there has been an ever-sharper focus on functional organization of living systems, with emphasis on molecular dynamics. Thus, life forms have come to be defined increasingly in terms of metabolism, growth, reproduction and responses to environmental perturbations. Since these properties occur in varying degrees in systems below the level of cellular organization, there has been a blurring of older models that restricted the concepts of life to cellular systems. At the same time, a search has begun for elemental as pects of molecular and atomic behavior that might better define properties common to all life forms. This search has led to an examination of nonlinear behavior in biological macromolecules, whether in response to electrical or chemical stimulation, for example, or as a means of signaling along a molecular chain, or as a means of energy transfer. Experimental knowledge in this area has grown rapidly in the past decade, and in some respects has outstripped theoretical models adequate to ex plain these new observations. Nevertheless, it can be claimed that there is now an impressive body of experiments implicating non linear, nonequilibrium processes as fundamental steps in sequential operations of biological systems.