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Author: N. St J. Braithwaite
Publisher:
Published: 2003
Total Pages: 2
ISBN-13:
DOWNLOAD EBOOKPlasma etching is finding new applications beyond the microelectronics industry. There are new challenges in the devising and controlling of plasma-surface interactions.
Author: National Research Council
Publisher: National Academies Press
Published: 1991-02-01
Total Pages: 88
ISBN-13: 0309045975
DOWNLOAD EBOOKPlasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
Published: 2024-10-15
Total Pages: 837
ISBN-13: 1394245378
DOWNLOAD EBOOKA new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Author: R.J. Shul
Publisher: Springer Science & Business Media
Published: 2000-08-28
Total Pages: 664
ISBN-13: 9783540667728
DOWNLOAD EBOOKThis volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
Published: 2024-08-28
Total Pages: 837
ISBN-13: 1394245394
DOWNLOAD EBOOKA new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Author: Francis F. Chen
Publisher: Springer Science & Business Media
Published: 2003-01-31
Total Pages: 228
ISBN-13: 9780306474972
DOWNLOAD EBOOKPlasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author: Paul Williams
Publisher: Springer Science & Business Media
Published: 1997-05-31
Total Pages: 634
ISBN-13: 9780792345671
DOWNLOAD EBOOKPlasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author:
Publisher:
Published: 1984
Total Pages: 328
ISBN-13:
DOWNLOAD EBOOKAuthor: Frank B. Rosmej
Publisher: Springer Nature
Published: 2021-09-06
Total Pages: 668
ISBN-13: 3030059685
DOWNLOAD EBOOKPlasma Atomic Physics provides an overview of the elementary processes within atoms and ions in plasmas, and introduces readers to the language of atomic spectra and light emission, allowing them to explore the various and fascinating radiative properties of matter. The book familiarizes readers with the complex quantum-mechanical descriptions of electromagnetic and collisional processes, while also developing a number of effective qualitative models that will allow them to obtain adequately comprehensive descriptions of collisional-radiative processes in dense plasmas, dielectronic satellite emissions and autoionizing states, hollow ion X-ray emissions, polarized atoms and ions, hot electrons, charge exchange, atomic population kinetics, and radiation transport. Numerous applications to plasma spectroscopy and experimental data are presented, which concern magnetic confinement fusion, inertial fusion, laser-produced plasmas, and X-ray free-electron lasers’ interaction with matter. Particular highlights include the development of quantum kinetics to a level surpassing the almost exclusively used quasi-classical approach in atomic population kinetics, the introduction of the recently developed Quantum-F-Matrix-Theory (QFMT) to study the impact of plasma microfields on atomic populations, and the Enrico Fermi equivalent photon method to develop the “Plasma Atom”, where the response properties and oscillator strength distribution are represented with the help of a local plasma frequency of the atomic electron density. Based on courses held by the authors, this material will assist students and scientists studying the complex processes within atoms and ions in different kinds of plasmas by developing relatively simple but highly effective models. Considerable attention is paid to a number of qualitative models that deliver physical transparency, while extensive tables and formulas promote the practical and useful application of complex theories and provide effective tools for non-specialist readers.
Author: Oleg O. Baranov
Publisher: Springer Nature
Published: 2022-05-31
Total Pages: 82
ISBN-13: 3031020359
DOWNLOAD EBOOKPlasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
