Physical vapor deposition and thermal stability of hard oxide coatings

Physical vapor deposition and thermal stability of hard oxide coatings

Author: Ludvig Landälv

Publisher: Linköping University Electronic Press

Published: 2019-04-26

Total Pages: 42

ISBN-13: 9176850889

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The state-of-the-art tools for machining metals are primarily based on a metal-ceramic composite (WC-Co) coated with different combinations of carbide, nitride, and oxide coatings. Combinations of these coating materials are optimized to withstand specific wear conditions. Oxide coatings, mainly α-Al2O3, are especially desired because of their high hot-hardness, chemical inertness with respect to the workpiece, and their low friction. The search for possible alloy elements, which may facilitate the deposition of such oxides by means of physical vapor deposition (PVD) techniques, has been the goal of this thesis. The sought alloy should form thermodynamically stable or metastable compounds, compatible with the temperature of use in metal cutting application. This thesis deals with process development and coating characterization of such new oxide alloy thin films, focusing on the Al-V-O, Al-Cr-Si-O, and Cr-Zr-O systems. Alloying aluminum oxide with iso-valent vanadium is a candidate for forming the desired alloys. Therefore, coatings of (Al1-xVx)2O3, with x ranging from 0 to 1, were deposited with reactive sputter deposition. X-ray diffraction showed three different crystal structures depending on V-metal fraction in the coating: α-V2O3 rhombohedral structure for 100 at.% V, a defect spinel structure for the intermediate region, (63 - 42 at.% V), and a gamma-alumina-like solid solution at lower V-content, (18 and 7 at.%), were observed, the later was shifted to larger d-spacing compared to the pure γ-Al2O3 sample obtained if deposited with only Al-target. Annealing the Al-rich coatings in air resulted in formation of V2O5 crystals on the surface of the coating after annealing to 500 °C for 42 at.% V and 700 °C for 18 at.% V metal fraction respectively. The highest thermal stability was shown for pure γ-Al2O3-coating which transformed to α-Al2O3 after annealing to 1100° C. Highest hardness was observed for the Al-rich oxides, ~24 GPa. The hardness then decreases with increasing V-content, larger than 7 at.% V metal fraction. Doping the Al2O3 coating with 7 at.% V resulted in a significant surface smoothening compared to the binary oxide. The measured hardness after annealing in air decreased in conjunction with the onset of further oxidation of the coatings. This work increases the understanding of this complicated material system with respect to possible phases formed with pulsed DC magnetron sputtering deposition as well as their response to annealing in air. The inherent difficulties of depositing insulating oxide films with PVD, requiring a closed electrical circuit, makes the investigation of process stability an important part of this research. In this context, I investigated the influence of adding small amount of Si in Al-Cr cathode on the coating properties in a pulsed DC industrial cathodic arc system and the plasma characteristics, process parameters, and coating properties in a lab DC cathodic arc system. Si was chosen here due to a previous study showing improved erosion behavior of Al-Cr-Si over pure Al-Cr cathode without Si incorporation in the coating. The effect of Si in the Al-Cr cathode in the industrial cathodic arc system showed slight improvements on the cathode erosion but Si was found in all coatings where Si was added in the cathode. The Si addition promoted the formation of the B1-like metastable cubic oxide phase and the incorporation led to reduced or equal hardness values compared to the corresponding Si-free processes. The DC-arc plasma study on the same material system showed only small improvements in the cathode erosion and process stability (lower pressure and cathode voltage) when introducing 5 at.% Si in the Al70Cr30-cathode. The presence of volatile SiO species could be confirmed through plasma analysis, but the loss of Si through these species was negligible, since the coating composition matched the cathode composition also under these conditions. The positive effect of added Si on the process stability at the cathode surface, should be weighed against Si incorporation in the coating. This incorporation seems to lead to a reduction in mechanical properties in the as-deposited coatings and promote the formation of a B1-like cubic metastable oxide structure for the (Al,Cr)2O3 oxide. This formation may or may not be beneficial for the final application since literature indicates a slight stabilization of the metastable phase upon Si-incorporation, contrary to the effect of Cr, which stabilizes the α-phase. The thermal stability of alloys for metal cutting application is crucial for their use. Previous studies on another alloy system, Cr-Zr-O, had shown solid solution, for Cr-rich compositions in that material system, in the sought corundum structure. The thermal stability of α-Cr0.28Zr0.10O0.61 coating deposited by reactive radio frequency (RF)-magnetron sputtering at 500 °C was therefore investigated here after annealing in vacuum up to 870 °C. The annealed samples showed transformation of α-(Cr,Zr)2O3 and amorphous ZrOx-rich areas into tetragonal ZrO2 and bcc-Cr. The instability of the α-(Cr,Zr)2O3 is surprising and possibly related to the annealing being done under vacuum, facilitating the loss of oxygen. Further in situ synchrotron XRD annealing studies on the α-Cr0.28Zr0.10O0.61 coating in air and in vacuum showed increased stability for the air annealed sample up to at least 975 °C, accompanied with a slight increase in ex-situ measured nanohardness. The onset temperature for formation of tetragonal ZrO2 was similar to that for isothermally vacuum annealing. The synchrotron-vacuum annealed coating again decomposed into bcc-Cr and t-ZrO2, with an addition of monoclinic–ZrO2 due to grain growth. The stabilization of the room temperature metastable tetragonal ZrO2 phase, due to surface energy effects present with small grains sizes, may prove to be useful for metal cutting applications. The observed phase segregation of α-(Cr,Zr)2O3 and formation of tetragonal ZrO2 with corresponding increase in hardness for this pseudobinary oxide system also opens up design routes for pseudobinary oxides with tunable microstructural and mechanical properties.


Coatings and Thin-Film Technologies

Coatings and Thin-Film Technologies

Author: Jaime Andres Perez Taborda

Publisher: BoD – Books on Demand

Published: 2019-01-03

Total Pages: 288

ISBN-13: 1789848709

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The field of coatings and thin-film technologies is rapidly advancing to keep up with new uses for semiconductor, optical, tribological, thermoelectric, solar, security, and smart sensing applications, among others. In this sense, thin-film coatings and structures are increasingly sophisticated with more specific properties, new geometries, large areas, the use of heterogeneous materials and flexible and rigid coating substrates to produce thin-film structures with improved performance and properties in response to new challenges that the industry presents. This book aims to provide the reader with a complete overview of the current state of applications and developments in thin-film technology, discussing applications, health and safety in thin films, and presenting reviews and experimental results of recognized experts in the area of coatings and thin-film technologies.


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing

Author: D. M. Mattox

Publisher: Cambridge University Press

Published: 2014-09-19

Total Pages: 947

ISBN-13: 0080946585

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This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.


Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings

Author: Peter M. Martin

Publisher: William Andrew

Published: 2009-12-01

Total Pages: 932

ISBN-13: 0815520328

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This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.


High Temperature Coatings

High Temperature Coatings

Author: Sudhangshu Bose

Publisher: Butterworth-Heinemann

Published: 2017-11-27

Total Pages: 418

ISBN-13: 0128047437

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High Temperature Coatings, Second Edition, demonstrates how to counteract the thermal effects of rapid corrosion and degradation of exposed materials and equipment that can occur under high operating temperatures. This is the first true practical guide on the use of thermally protective coatings for high-temperature applications, including the latest developments in materials used for protective coatings. It covers the make-up and behavior of such materials under thermal stress and the methods used for applying them to specific types of substrates, as well as invaluable advice on inspection and repair of existing thermal coatings. With his long experience in the aerospace gas turbine industry, the author has compiled the very latest in coating materials and coating technologies, as well as hard-to-find guidance on maintaining and repairing thermal coatings, including appropriate inspection protocols. The book is supplemented with the latest reference information and additional support to help readers find more application- and industry-type coatings specifications and uses. - Offers an overview of the underlying fundamental concepts of thermally-protective coatings, including thermodynamics, energy kinetics, crystallography and equilibrium phases - Covers essential chemistry and physics of underlying substrates, including steels, nickel-iron alloys, nickel-cobalt alloys and titanium alloys - Provides detailed guidance on a wide variety of coating types, including those used against high temperature corrosion and oxidative degradation and thermal barrier coatings


Handbook of Manufacturing Engineering and Technology

Handbook of Manufacturing Engineering and Technology

Author: Andrew Y. C. Nee

Publisher: Springer

Published: 2014-10-31

Total Pages: 0

ISBN-13: 9781447146698

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The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.


Coated Metal

Coated Metal

Author: Leonid Tushinsky

Publisher: Springer Science & Business Media

Published: 2002-04-23

Total Pages: 468

ISBN-13: 9783540431268

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This book can be viewed as a scientific investigation combined with methodological studies. For practical reasons each of the methods is described in the following general manner including: the uses and the scientific investigation tasks; methods of sampling; testing equipment; test preparation; tests; data processing; controversial issues and conclusions. Each of the 37 methods contains a range of 1 to 8 variants. As far as we know, the book is the first publication in the field.


Materials Chemistry

Materials Chemistry

Author: Bradley D. Fahlman

Publisher: Springer Nature

Published: 2023-03-12

Total Pages: 905

ISBN-13: 3031187849

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This award-winning textbook delivers an earnest and comprehensive treatment of the rapidly evolving field of Materials Chemistry. It addresses inorganic-, organic-, and nano-based materials from a structure vs. property treatment, providing a suitable breadth and depth coverage of the field—in a concise and accessible format. The updated 4th edition features significant updates to glasses and ceramics, solid-state impurities, nanomaterial toxicity, as well as materials used in energy storage, photovoltaic, and electronics applications. Advanced fabrication techniques such as additive manufacturing (3-D printing) and dynamic light scattering (DLS) characterization of suspended nanoparticles are now also included. This new edition also expands the coverage of sustainability and life cycle analysis, of increasing importance for a world plagued with the effects of climate change. Recognized by a 2008 Textbook Excellence Award from the Text and Academic Authors Association (TAA), Fahlman’s Materials Chemistry is ideal for upper-level undergraduate students, as well as first-year graduate students in chemistry, physics, or engineering fields, and may also serve as a valuable reference to industrial researchers. Each chapter concludes with a section that describes important materials applications and an updated list of thought-provoking questions.


Nanocoatings and Ultra-Thin Films

Nanocoatings and Ultra-Thin Films

Author: Abdel Salam Hamdy Makhlouf

Publisher: Elsevier

Published: 2011-09-14

Total Pages: 449

ISBN-13: 0857094904

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Coatings are used for a wide range of applications, from anti-fogging coatings for glass through to corrosion control in the aerospace and automotive industries. Nanocoatings and ultra-thin films provides an up-to-date review of the fundamentals, processes of deposition, characterisation and applications of nanocoatings.Part one covers technologies used in the creation and analysis of thin films, including chapters on current and advanced coating technologies in industry, nanostructured thin films from amphiphilic molecules, chemical and physical vapour deposition methods and methods for analysing nanocoatings and ultra-thin films. Part two focuses on the applications of nanocoatings and ultra-thin films, with chapters covering topics such as nanocoatings for architectural glass, packaging applications, conventional and smart nanocoatings for corrosion protection in aerospace engineering and ultra-thin membranes for sensor applications.With its distinguished editors and international team of contributors, Nanocoatings and ultra-thin films is an essential reference for professional engineers in the glazing, consctruction, electronics and transport industries, as well as all those with an academic research interest in the field. - Provides an up-to-date review of the fundamentals, processes of deposition, characterisation and applications of nanocoatings - Focuses on the applications of nanocoatings and ultra-thin films, covering topics such as nanocoatings for architectural glass, packaging applications and ultra-thin membranes for sensor applications - Includes chapters on current and advanced coating technologies in industry, nanostructured thin films from amphiphilic molecules, chemical and physical vapour deposition methods and methods for analysing nanocoatings and ultra-thin films


Adhesion Aspects of Thin Films, Volume 1

Adhesion Aspects of Thin Films, Volume 1

Author: Kash L. Mittal

Publisher: CRC Press

Published: 2014-07-30

Total Pages: 279

ISBN-13: 1466562242

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This book chronicles the proceedings of the First International Symposium on Adhesion Aspects of Thin Films, held in Newark, New Jersey, October 28-29, 1999. Films and coatings are used for a variety of purposes a decorative, protective, functional, etc. a in a host of applications. Irrespective of the intended function or application of a film