Photon, Beam and Plasma Enhanced Processing, 1987
Author: A. Golanski
Publisher:
Published: 1987
Total Pages: 742
ISBN-13:
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Author: A. Golanski
Publisher:
Published: 1987
Total Pages: 742
ISBN-13:
DOWNLOAD EBOOKAuthor: European Materials Research Society. Conference
Publisher:
Published: 1987
Total Pages: 701
ISBN-13:
DOWNLOAD EBOOKAuthor:
Publisher:
Published: 1987
Total Pages:
ISBN-13: 9782868830616
DOWNLOAD EBOOKAuthor: E.F. Krimmel
Publisher: Elsevier
Published: 1989-02-01
Total Pages: 744
ISBN-13: 0444596364
DOWNLOAD EBOOKThis symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author: I.W. Boyd
Publisher: Elsevier
Published: 1990-02-01
Total Pages: 482
ISBN-13: 0444596658
DOWNLOAD EBOOKThis volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field.
Author: R.J. Shul
Publisher: Springer Science & Business Media
Published: 2011-06-28
Total Pages: 664
ISBN-13: 3642569897
DOWNLOAD EBOOKPattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author: Ian W. Boyd
Publisher: Springer Science & Business Media
Published: 2013-03-08
Total Pages: 328
ISBN-13: 3642831362
DOWNLOAD EBOOKThis text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.
Author: Y. Pauleau
Publisher: Springer Science & Business Media
Published: 2002-04-30
Total Pages: 392
ISBN-13: 9781402005244
DOWNLOAD EBOOKProceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001
Author: I. W. Boyd
Publisher:
Published: 1989
Total Pages: 703
ISBN-13:
DOWNLOAD EBOOKAuthor: National Research Council
Publisher: National Academies Press
Published: 1991-02-01
Total Pages: 88
ISBN-13: 0309045975
DOWNLOAD EBOOKPlasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.