Phase formation in multicomponent films based on 3d transition metals

Phase formation in multicomponent films based on 3d transition metals

Author: Smita Gangaprasad Rao

Publisher: Linköping University Electronic Press

Published: 2021-03-18

Total Pages: 28

ISBN-13: 9179296688

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The need for materials that enhance life span, performance, and sustainability has propelled research in alloy design from binary alloys to more complex systems such as multicomponent alloys. The CoCrFeMnNi alloy, more commonly known as the Cantor alloy, is one of the most studied systems in bulk as well as thin film. The addition of light elements such as boron, carbon, nitrogen, and oxygen is a means to alter the properties of these materials. The challenge lies in understanding the process of phase formation and microstructure evolution on addition of these light elements. To address this challenge, I investigate multicomponent alloys based on a simplified version of the Cantor alloy. My thesis investigates the addition of nitrogen into a Cantor variant system as a step towards understanding the full Cantor alloy. Me1-yNy (Me = Cr + Fe + Co, 0.14 ≤ y ≤0.28 thin films were grown by reactive magnetron sputtering. The films showed a change in structure from fcc to mixed fcc+bcc and finally a bcc-dominant film with increasing nitrogen content. The change in phase and microstructure influenced the mechanical and electrical properties of the films. A maximum hardness of 11 ± 0.7 GPa and lowest electrical resistivity of 28 ± 5 μΩcm were recorded in the film with mixed phase (fcc+bcc) crystal structure. Copper was added as a fourth metallic alloying element into the film with the mixed fcc + bcc structure, resulting in stabilization of the bcc phase even though Cu has been reported to be a fcc stabilizer. The energy brought to the substrate increases on Cu addition which promotes surface diffusion of the ions and leads to small but randomly oriented grains. The maximum hardness recorded by nanoindentation was found to be 13.7 ± 0.2 GPa for the sample Cu0.05. While it is generally believed that large amounts of Cu can be detrimental to thin film properties due to segregation, this study shows that small amounts of Cu in the multicomponent matrix could be beneficial in stabilizing phases as well as for mechanical properties. This thesis thus provides insights into the phase formation of nitrogen-containing multicomponent alloys.


Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings

Author: Peter M. Martin

Publisher: William Andrew

Published: 2009-12-01

Total Pages: 932

ISBN-13: 0815520328

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This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.


Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices

Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices

Author: O. Auciello

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 625

ISBN-13: 9401117276

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The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.


Reactive Sputter Deposition

Reactive Sputter Deposition

Author: Diederik Depla

Publisher: Springer Science & Business Media

Published: 2008-06-24

Total Pages: 584

ISBN-13: 3540766642

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In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.