First Text Retrieval Conference (TREC-1)

First Text Retrieval Conference (TREC-1)

Author: D. K. Harman

Publisher: DIANE Publishing

Published: 1995-10

Total Pages: 527

ISBN-13: 0788125214

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Held in Gaithersburg, MD, Nov. 4-6, 1992. Evaluates new technologies in information retrieval. Numerous graphs, tables and charts.


Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results (rev. Ed. )

Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results (rev. Ed. )

Author: Barry N. Taylor

Publisher: DIANE Publishing

Published: 2009-11

Total Pages: 25

ISBN-13: 1437915566

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Results of measurements and conclusions derived from them constitute much of the technical information produced by the National Institute of Standards and Technology (NIST). In July 1992 the Director of NIST appointed an Ad Hoc Committee on Uncertainty Statements and charged it with recommending a policy on this important topic. The Committee concluded that the CIPM approach could be used to provide quantitative expression of measurement that would satisfy NIST¿s customers¿ requirements. NIST initially published a Technical Note on this issue in Jan. 1993. This 1994 edition addresses the most important questions raised by recipients concerning some of the points it addressed and some it did not. Illustrations.


X-Ray Metrology in Semiconductor Manufacturing

X-Ray Metrology in Semiconductor Manufacturing

Author: D. Keith Bowen

Publisher: CRC Press

Published: 2018-10-03

Total Pages: 297

ISBN-13: 1420005650

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The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.