Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Currently surface patterning is achieved by means of optical lithographic techniques but with industry moving towards the fabrication of devices with size features of 100 nm less, the technological community is looking for alternative approaches to materials fabrication at the nanoscale. By using nanolithography scientists can drive patterning currents through surfaces while building a 3D structure from a series of patterned layers. Electron induced chemical lithography can create ultra-high resolution templates for the site selective immobilisation of molecules, to form functional, hierarchic.
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Scanning probe techniques. Scanning probe microscopy based nanoscale patterning and fabrication / X. N. Xie, H. J. Chung and A. T. S. Wee. Nanoscale characterization by scanning tunneling microscopy / H. Xu ... [et al.] -- Nanofabrication. EUV lithography for semiconductor manufacturing and nanofabrication / H. Kinoshita. Synchrotron-radiation-supported high-aspect-ratio nanofabrication / A. Chen ... [et al.] -- Functional nanomaterials. Chemical interactions at noble metal nanoparticle surfaces - catalysis, sensors and devices / A. S. Nair. Diamond-like carbon : a new material base for nano-architectures / X. Li and D. H. C. Chua. Hotplate technique for nanomaterials / Y. Zhu and C. H. Sow -- Molecular engineering. [Pie symbol]-d interaction based molecular conducting magnets : how to increase the effects of the [Pie symbol]-d interaction / A. Miyazaki and T. Enoki. Recent developments on porphyrin assemblies / R. Charvet ... [et al.] -- Bionanotechnology and nanomedicine. Nanostructures from designer peptides / B. T. Ong, P. K. Ajikumar and S. Valiyaveettil. Nanotechnology and human diseases / G. Y. H. Lee and C. T. Lim. Nanomedicine : nanoparticles of biodegradable polymers for cancer diagnosis and treatment / S. S. Feng.
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps. For increased accessibility, simplified and consistent notations are used throughout the text. Full-color pages illustrate the connections between figures and equations.
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
The book series Nanomaterials for the Life Sciences, provides an in-depth overview of all nanomaterial types and their uses in the life sciences. Each volume is dedicated to a specific material class and covers fundamentals, synthesis and characterization strategies, structure-property relationships and biomedical applications. The series brings nanomaterials to the Life Scientists and life science to the Materials Scientists so that synergies are seen and developed to the fullest. Written by international experts of various facets of this exciting field of research, the series is aimed at scientists of the following disciplines: biology, chemistry, materials science, physics, bioengineering, and medicine, together with cell biology, biomedical engineering, pharmaceutical chemistry, and toxicology, both in academia and fundamental research as well as in pharmaceutical companies. VOLUME 5 - Nanostructured Thin Films and Surfaces
