Extensively revised and updated, this new edition of a classic text presents a unified approach to crystallography and to the defects found within crystals. The book combines the classical and exact description of symmetry of a perfect crystal with the possible geometries of the major defects-dislocations, stacking faults, point defects, twins, interfaces and the effects of martensitic transformations. A number of important concepts and exciting new topics have been introduced in this second edition, including piezoelectricity, liquid crystals, nanocrystalline concepts, incommensurate materials and the structure of foamed and amorphous solids. The coverage of quasicrystalline materials has been extended, and the data tables, appendices and references have been fully updated. Reinforcing its unrivalled position as the core text for teaching crystallography and crystal defects, each chapter includes problem sets with brief numerical solutions at the end of the book. Detailed worked solutions, supplementary lecture material and computer programs for crystallographic calculations are provided online (http://booksupport.wiley.com).
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Elementary Processes in Excitations and Reactions on Solid Surfaces explores the fundamental nature of dynamics on solid surfaces. Attempts are made to reveal various aspects of elementary processes in excitations and reactions on solid surfaces by recent theoretical and experimental developments of the subjects such as molecular beams interacting with surfaces, ion beam scattering, laser-induced dynamical processes, electronically induced dynamical processes, and optical properties of solid surfaces. This volume is devided into three parts. Part I is concerned mainly with the rich reaction dynamics on potential-energy surfaces. Part II is devoted to the interplay of excitations and reactions with particular attention given to the charge transfer as well as the energy transfer between well-characterized surfaces and beams. In Part III, new and rapidly developing methods are introduced.
All-inclusive opto electronics guide A valuable "must-have" tool for electronic and optical engineers, this Handbook is the only single-volume, tell-it-all guide to the use of optical devices and light in electronics systems. Developed by a towering figure in the field, this manual familiarizes you with UV, VUV and X-Ray lasers; visible, solid-state, semiconductor and infrared gas lasers; FEL and ultrashort laser pulses; visible and infrared optical materials; infrared and imaging detectors; optical fibers and fiber optic sensors; holography; laser spectroscopy and photochemistry; high resolution lithography for optoelectronics; and much more. In this up-to-the-minute edition you'll find new chapters on optical communications, electro-optic devices, and high intensity optical fields, in addition to extensively updated material throughout, and abundant charts, diagrams and data tables.