Maskless, Resistless Ion Beam Lithography Processes
Author: Qing Ji (Ph.D.)
Publisher:
Published: 2003
Total Pages: 266
ISBN-13:
DOWNLOAD EBOOKRead and Download eBook Full
Author: Qing Ji (Ph.D.)
Publisher:
Published: 2003
Total Pages: 266
ISBN-13:
DOWNLOAD EBOOKAuthor: D.J. Ehrlich
Publisher: Springer Science & Business Media
Published: 2012-12-06
Total Pages: 286
ISBN-13: 9400914091
DOWNLOAD EBOOKProceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987
Author: Ivo Utke
Publisher: Oxford University Press
Published: 2012-05-01
Total Pages: 840
ISBN-13: 0190453621
DOWNLOAD EBOOKNanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Author:
Publisher:
Published: 2004
Total Pages: 806
ISBN-13:
DOWNLOAD EBOOKAuthor: William B. Glendinning
Publisher: William Andrew
Published: 2012-12-02
Total Pages: 672
ISBN-13: 1437728227
DOWNLOAD EBOOKThis handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author: Joseph W. Haus
Publisher: Woodhead Publishing
Published: 2016-01-09
Total Pages: 428
ISBN-13: 1782424873
DOWNLOAD EBOOKFundamentals and Applications of Nanophotonics includes a comprehensive discussion of the field of nanophotonics, including key enabling technologies that have the potential to drive economic growth and impact numerous application domains such as ICT, the environment, healthcare, military, transport, manufacturing, and energy. This book gives readers the theoretical underpinnings needed to understand the latest advances in the field. After an introduction to the area, chapters two and three cover the essential topics of electrodynamics, quantum mechanics, and computation as they relate to nanophotonics. Subsequent chapters explore materials for nanophotonics, including nanoparticles, photonic crystals, nanosilicon, nanocarbon, III-V, and II-VI semiconductors. In addition, fabrication and characterization techniques are addressed, along with the importance of plasmonics, and the applications of nanophotonics in devices such as lasers, LEDs, and photodetectors. - Covers electrodynamics, quantum mechanics and computation as these relate to nanophotonics - Reviews materials, fabrication and characterization techniques for nanophotonics - Describes applications of the technology such as lasers, LEDs and photodetectors
Author: Marc J. Madou
Publisher: CRC Press
Published: 2011-06-13
Total Pages: 670
ISBN-13: 1439895309
DOWNLOAD EBOOKDesigned for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the d
Author: ASM International
Publisher: ASM International
Published: 2005-01-01
Total Pages: 524
ISBN-13: 1615030883
DOWNLOAD EBOOKAuthor: Zhiming M. Wang
Publisher: Springer Science & Business Media
Published: 2014-01-04
Total Pages: 536
ISBN-13: 331902874X
DOWNLOAD EBOOKFIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electrical engineering, and materials science departments as a reference on materials science and device design.
Author: Marc J. Madou
Publisher: CRC Press
Published: 2018-12-14
Total Pages: 1983
ISBN-13: 1482274663
DOWNLOAD EBOOKNow in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.