Mapping the Response of a Chemically-amplified Negative Photoresist for X-ray Lithography
Author: Paul M. Dentinger
Publisher:
Published: 1998
Total Pages: 512
ISBN-13:
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Author: Paul M. Dentinger
Publisher:
Published: 1998
Total Pages: 512
ISBN-13:
DOWNLOAD EBOOKAuthor: Steven J. Rhyner
Publisher:
Published: 1998
Total Pages: 312
ISBN-13:
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Publisher:
Published: 1997
Total Pages: 806
ISBN-13:
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Publisher:
Published: 1998
Total Pages: 790
ISBN-13:
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Publisher:
Published: 1997
Total Pages: 1860
ISBN-13:
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Publisher: Elsevier
Published: 2016-11-08
Total Pages: 636
ISBN-13: 0081003587
DOWNLOAD EBOOKAs the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author:
Publisher:
Published: 1992
Total Pages: 2264
ISBN-13:
DOWNLOAD EBOOKSince its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Author: M. Gentili
Publisher: Springer Science & Business Media
Published: 2013-03-09
Total Pages: 214
ISBN-13: 9401582610
DOWNLOAD EBOOKSuccess in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Author: Chris Mack
Publisher: John Wiley & Sons
Published: 2011-08-10
Total Pages: 503
ISBN-13: 1119965071
DOWNLOAD EBOOKThe fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.